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鈦鉭摻雜氮氧化鉿鑭在前瞻金氧半電容特性研究 = Study of tix...

Hung-Yang Tsai

鈦鉭摻雜氮氧化鉿鑭在前瞻金氧半電容特性研究 = Study of tixtay-doped hflaon on electrical and reliability characteristics of advanced metal-oxide-semiconductor capacitors

Record Type:	Language materials, printed : monographic
Paralel Title:	Study of tixtay-doped hflaon on electrical and reliability characteristics of advanced metal-oxide-semiconductor capacitors
Author:	蔡弘揚,
Secondary Intellectual Responsibility:	鄭錦隆,
Place of Publication:	雲林縣
Published:	國立虎尾科技大學;
Year of Publication:	民98[2009]
Edition:	初版
Description:	87面圖 : 30公分;
Subject:	氮氧化鈦鉭鉿鑭
Subject:	氮氧化鉿鑭
Subject:	濺鍍機
Subject:	高介電係數材料
Subject:	HfLaOxNy
Subject:	HfLaTiTaON
Subject:	High-k materials
Subject:	sputter
Online resource:	http://cetd.lib.nfu.edu.tw/etdservice/view_metadata?etdun=U0028-0907200922485700

鈦鉭摻雜氮氧化鉿鑭在前瞻金氧半電容特性研究 = Study of tixtay-doped hflaon on electrical and reliability characteristics of advanced metal-oxide-semiconductor capacitors
蔡, 弘揚

鈦鉭摻雜氮氧化鉿鑭在前瞻金氧半電容特性研究 = Study of tixtay-doped hflaon on electrical and reliability characteristics of advanced metal-oxide-semiconductor capacitors / 蔡弘揚撰 - 初版. - 雲林縣 : 國立虎尾科技大學, 民98[2009]. - 87面 ; 圖 ; 30公分.
含參考書目.
氮氧化鈦鉭鉿鑭氮氧化鉿鑭濺鍍機高介電係數材料HfLaOxNyHfLaTiTaONHigh-k materialssputter

鄭, 錦隆

鈦鉭摻雜氮氧化鉿鑭在前瞻金氧半電容特性研究 = Study of tixtay-doped hflaon on electrical and reliability characteristics of advanced metal-oxide-semiconductor capacitors
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205 $a 初版
210 $a 雲林縣 $d 民98[2009] $c 國立虎尾科技大學
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314 $a 指導教授 : 鄭錦隆
320 $a 含參考書目
328 $a 碩士論文--國立虎尾科技大學機械與機電工程研究所
510 1 $a Study of tixtay-doped hflaon on electrical and reliability characteristics of advanced metal-oxide-semiconductor capacitors
610 0 $a 氮氧化鈦鉭鉿鑭
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