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Advances in CMP/polishing technologi...

Kurokawa, Syuhei.

Advances in CMP/polishing technologies for the manufacture of electronic devices

紀錄類型:	書目-語言資料,印刷品 : Monograph/item
正題名/作者:	Advances in CMP/polishing technologies for the manufacture of electronic devices/ edited by Toshiro Doi, Ioan D. Marinescu, Syuhei Kurokawa.
其他作者:	Doi, Toshiro.
出版者:	Oxford :William Andrew, : 2012.,
面頁冊數:	1 online resource (xii, 317 p.)
附註:	Includes index.
標題:	Electrolytic polishing. -
電子資源:	http://www.sciencedirect.com/science/book/9781437778595
ISBN:	9781437778595

Advances in CMP/polishing technologies for the manufacture of electronic devices
Advances in CMP/polishing technologies for the manufacture of electronic devices[electronic resource] /edited by Toshiro Doi, Ioan D. Marinescu, Syuhei Kurokawa. - 1st ed. - Oxford :William Andrew,2012. - 1 online resource (xii, 317 p.)

Includes index.

ISBN: 9781437778595Subjects--Topical Terms:

874130
Electrolytic polishing.

LC Class. No.: TS670 / .A386 2012eb

Dewey Class. No.: 671.7/2

Advances in CMP/polishing technologies for the manufacture of electronic devices
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245 0 0 $a Advances in CMP/polishing technologies for the manufacture of electronic devices $h [electronic resource] / $c edited by Toshiro Doi, Ioan D. Marinescu, Syuhei Kurokawa.
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650 0 $a Grinding and polishing. $3 712634
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