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半導體製程離子佈植機水道設備散熱之有限元素法與最佳化水道設計 = = F...

彭威幀

半導體製程離子佈植機水道設備散熱之有限元素法與最佳化水道設計 = = Finite Element Analysis and Optimal Design of Cooling System for Ion Implantation Equipment in Semiconductor Manufacturing Process /

Record Type:	Language materials, printed : Monograph/item
Title/Author:	半導體製程離子佈植機水道設備散熱之有限元素法與最佳化水道設計 =/ 彭威幀.
Reminder of title:	Finite Element Analysis and Optimal Design of Cooling System for Ion Implantation Equipment in Semiconductor Manufacturing Process /
remainder title:	Finite Element Analysis and Optimal Design of Cooling System for Ion Implantation Equipment in Semiconductor Manufacturing Process.
Author:	彭威幀
Published:	雲林縣 :國立虎尾科技大學 , : 民113.06.,
Description:	[9], 51面 :圖, 表 ; : 30公分.;
Notes:	指導教授: 謝傑任.
Subject:	Thermal Flow Analysis. -
Online resource:	電子資源

半導體製程離子佈植機水道設備散熱之有限元素法與最佳化水道設計 = = Finite Element Analysis and Optimal Design of Cooling System for Ion Implantation Equipment in Semiconductor Manufacturing Process /
彭威幀

半導體製程離子佈植機水道設備散熱之有限元素法與最佳化水道設計 =Finite Element Analysis and Optimal Design of Cooling System for Ion Implantation Equipment in Semiconductor Manufacturing Process /Finite Element Analysis and Optimal Design of Cooling System for Ion Implantation Equipment in Semiconductor Manufacturing Process.彭威幀. - 初版. - 雲林縣 :國立虎尾科技大學 ,民113.06. - [9], 51面 :圖, 表 ;30公分.

指導教授: 謝傑任.

碩士論文--國立虎尾科技大學動力機械工程系機械與機電工程碩士班.

含參考書目.

本研究旨在提高半導體製程中離子佈植機水道設備的散熱效率，從而增進製程的穩定性與效率。為了達到這一目標，我們採用了有限元素法和最佳化設計。首先，我們利用有限元素法對水道結構進行了詳細的模擬分析，以評估方案的熱傳特性。透過模擬，我們能夠準確地瞭解水道內部的溫度分佈、熱流動情況以及熱傳導效率，進而識別出存在的散熱問題和潛在的改進空間。接下來，我們利用最佳化方法，尋求最佳的水道設計參數，以最大程度地提高散熱效率並降低能源消耗。通過將最佳化設計，我們能夠快速有效地搜索出最優解，從而實現對水道結構進行全面優化。研究結果顯示，通過最佳化水道設計，能夠顯著提升離子佈植機的散熱效率，有效降低系統的運行溫度，進而改善製程的穩定性和效率。此外，最佳化設計還能夠減少能源消耗，降低運行成本，具有經濟效益和環境效益的雙重優勢。總的來說，本研究的成果為半導體製程提供了重要的技術支持和參考依據，為推動半導體製程的進一步優化和提升提供了有力的技術保障。.

(平裝)Subjects--Topical Terms:

1451429
Thermal Flow Analysis.

半導體製程離子佈植機水道設備散熱之有限元素法與最佳化水道設計 = = Finite Element Analysis and Optimal Design of Cooling System for Ion Implantation Equipment in Semiconductor Manufacturing Process /
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245 1 0 $a 半導體製程離子佈植機水道設備散熱之有限元素法與最佳化水道設計 = $b Finite Element Analysis and Optimal Design of Cooling System for Ion Implantation Equipment in Semiconductor Manufacturing Process / $c 彭威幀.
246 1 1 $a Finite Element Analysis and Optimal Design of Cooling System for Ion Implantation Equipment in Semiconductor Manufacturing Process.
250 $a 初版.
260 # $a 雲林縣 : $b 國立虎尾科技大學 , $c 民113.06.
300 $a [9], 51面 : $b 圖, 表 ; $c 30公分.
500 $a 指導教授: 謝傑任.
500 $a 學年度: 112.
502 $a 碩士論文--國立虎尾科技大學動力機械工程系機械與機電工程碩士班.
504 $a 含參考書目.
520 3 $a 本研究旨在提高半導體製程中離子佈植機水道設備的散熱效率，從而增進製程的穩定性與效率。為了達到這一目標，我們採用了有限元素法和最佳化設計。首先，我們利用有限元素法對水道結構進行了詳細的模擬分析，以評估方案的熱傳特性。透過模擬，我們能夠準確地瞭解水道內部的溫度分佈、熱流動情況以及熱傳導效率，進而識別出存在的散熱問題和潛在的改進空間。接下來，我們利用最佳化方法，尋求最佳的水道設計參數，以最大程度地提高散熱效率並降低能源消耗。通過將最佳化設計，我們能夠快速有效地搜索出最優解，從而實現對水道結構進行全面優化。研究結果顯示，通過最佳化水道設計，能夠顯著提升離子佈植機的散熱效率，有效降低系統的運行溫度，進而改善製程的穩定性和效率。此外，最佳化設計還能夠減少能源消耗，降低運行成本，具有經濟效益和環境效益的雙重優勢。總的來說，本研究的成果為半導體製程提供了重要的技術支持和參考依據，為推動半導體製程的進一步優化和提升提供了有力的技術保障。.
520 3 $a The aim of this study is to enhance the heat dissipation efficiency of the ion implantation machine's water channel equipment in semiconductor manufacturing processes, thereby improving process stability and efficiency. To achieve this goal, we employed the finite element method and optimization design. Firstly, detailed simulation analysis of the water channel structure was conducted using the finite element method to evaluate the thermal characteristics of different schemes. Through simulations, we accurately understood the temperature distribution, heat flow, and thermal conduction efficiency inside the water channel, thereby identifying existing heat dissipation issues and potential improvement areas. Subsequently, we utilized optimization methods to seek the optimal parameters for water channel design, aiming to maximize heat dissipation efficiency and reduce energy consumption. Through optimization design, we were able to rapidly and effectively search for the optimal solution, achieving comprehensive optimization of the water channel structure. The results indicate that through optimized water channel design, significant improvement in heat dissipation efficiency of the ion implantation machine can be achieved, effectively reducing system operating temperature and enhancing process stability and efficiency. Additionally, the optimized design can reduce energy consumption, lowering operating costs, and offering dual economic and environmental benefits. In conclusion, the findings of this study provide crucial technical support and reference for semiconductor manufacturing processes, offering robust technical assurance for further optimization and enhancement of semiconductor manufacturing processes..
563 $a (平裝)
650 # 4 $a Thermal Flow Analysis. $3 1451429
650 # 4 $a optimal design. $3 1044246
650 # 4 $a finite element method. $3 998288
650 # 4 $a integrated radiator. $3 1451428
650 # 4 $a ion implantation. $3 1451427
650 # 4 $a 熱流分析. $3 1451426
650 # 4 $a 最佳化設計. $3 1219190
650 # 4 $a 有限元素法. $3 995074
650 # 4 $a 一體式散熱器. $3 1451425
650 # 4 $a 離子佈植. $3 1451424
856 7 # $u https://handle.ncl.edu.tw/11296/88e7u9 $z 電子資源 $2 http