electrical characterization.

利用電漿增強化學氣相沉積法製備氫化碳氧化矽薄膜之研究 = = Study on the Preparation of Hydrogenated Silicon Oxy-Carbon Films Using Plasma-Enhanced Chemical Vapor Deposition / by: (Language materials, printed)

旋塗塗佈法.

PECVD.

高頻電漿增強化學氣相沉積法.

致孔劑.

奈米球.

high temperature annealing furnace.

electrical characterization.

porogenic agents.

nanospheres.

高溫退火爐.

thermal stability.

amorphous hydrogenated silicon carbide films.

spin coating method.

熱穩定性.

表面粗糙度.

surface roughness.

電特性分析.

非晶氫化碳氧化矽薄膜.