半导体中离子注入
張光華

 

  • 半导体中离子注入
  • Record Type: Language materials, printed : monographic
    Author: 加特G,
    Alternative Intellectual Responsibility: 格蘭特W.A,
    Secondary Intellectual Responsibility: 張光華,
    Secondary Intellectual Responsibility: 趙越,
    Place of Publication: 北京市
    Published: 國防工業; 國防工業;
    Year of Publication: 民71
    Edition: 1 版
    Description: 4,245 面圖 : 21公分;
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