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Principles of plasma discharges and ...

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Lieberman, M. A

Principles of plasma discharges and materials processing

Record Type:	Language materials, printed : monographic
Author:	LiebermanM. A,
Secondary Intellectual Responsibility:	LichtenbergAllan J,
Place of Publication:	Hoboken, N.J
Published:	Wiley-Interscience;
Year of Publication:	c2005
Edition:	2nd ed
Description:	xxxv, 757 pill : 25 cm;
Subject:	Plasma dynamics -
Subject:	Thin films - Surfaces -
Subject:	Plasma etching -
Subject:	Plasma chemistry - Industrial applications -
ISBN:	0471720011

Principles of plasma discharges and materials processing
Lieberman, M. A

Principles of plasma discharges and materials processing / Michael A. Lieberman, Allan J. Lichtenberg - 2nd ed. - Hoboken, N.J : Wiley-Interscience, c2005. - xxxv, 757 p ; ill ; 25 cm.
Includes bibliographical references (p. 735-748) and index.
ISBN 0471720011
Plasma dynamicsThin filmsPlasma etchingPlasma chemistry -- Surfaces -- Industrial applications

Lichtenberg, Allan J

Principles of plasma discharges and materials processing
LDR:00667cam 2200205 i 450 001 489389
005 20101023214554.0
009 a2004058503
010 1 $3 ,814 $a 0471720011 $b (hbk.) $d NT
100 $a 20080130f 2005m y0engy01 b
101 0 $a eng
200 1 $a Principles of plasma discharges and materials processing $f Michael A. Lieberman, Allan J. Lichtenberg
205 $a 2nd ed
210 $a Hoboken, N.J $c Wiley-Interscience $d c2005
215 0 $a xxxv, 757 p $c ill $d 25 cm
320 $a Includes bibliographical references (p. 735-748) and index
606 $a Plasma dynamics $3 480173 $2 lc $3 732488
606 $a Thin films $x Surfaces $3 407324 $2 lc $3 728548
606 $a Plasma etching $3 480174 $2 lc $3 732489
606 $a Plasma chemistry $x Industrial applications $3 480175 $2 lc $3 732490
676 $a 530.4/4 $v 22
680 $a QC718.5.D9 $b L54 2005
700 $a Lieberman $b M. A $3 480171
702 $a Lichtenberg $b Allan J $3 480172
801 0 $b DLC
801 0 $a cw $b BIB $c 20061121
801 1 $a cw $b 虎尾科技大學圖書館 $c 20061121

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530.44 L716 2005

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