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Hf-based high-k dielectrics : proces...

Kim, Young-Hee

Hf-based high-k dielectrics : process development, performance characterization, and reliability

紀錄類型:	書目-語言資料,印刷品 : 單行本
副題名:	process development, performance characterization, and reliability
作者:	KimYoung-Hee,
其他作者:	LeeJack Chung-Yeung,
出版地:	[San Rafael, Calif.]
出版者:	Morgan & Claypool Publishers;
出版年:	c2005
版本:	1st ed
面頁冊數:	x, 92 pll : 24cm;
集叢名:
標題:	Metal oxide semiconductor field-effect transistors -
標題:	Breakdown (Electricity) -
標題:	Semiconductors - Junctions -
標題:	Integrated circuits - Reliability -
標題:	Hafnium oxide -
標題:	Dielectrics -
附註:	This volume is a printed version of a work that appears in, "Synthesis, the digital library of engineering and computer science"
ISBN:	1598290045

Hf-based high-k dielectrics : process development, performance characterization, and reliability
Kim, Young-Hee

Hf-based high-k dielectrics : process development, performance characterization, and reliability / Young-Hee Kim, Jack C. Lee - 1st ed. - [San Rafael, Calif.] : Morgan & Claypool Publishers, c2005. - x, 92 p ; ll ; 24cm. - ( ; v. 1, no. 1).
This volume is a printed version of a work that appears in, "Synthesis, the digital library of engineering and computer science".
Includes bibliographical references.
ISBN 1598290045ISBN 9781598293548
Metal oxide semiconductor field-effect transistorsBreakdown (Electricity)SemiconductorsIntegrated circuitsHafnium oxideDielectrics -- Junctions -- Reliability

Lee, Jack Chung-Yeung

Hf-based high-k dielectrics : process development, performance characterization, and reliability
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