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陰極電弧電漿沉積Ti-Si-N、Ti-Si-C-N薄膜及特性研究 = D...

Jun-Hao Chen

陰極電弧電漿沉積Ti-Si-N、Ti-Si-C-N薄膜及特性研究 = Deposition and characterization of ti-si-n, ti-si-c-n films by cathodic arc plasma evaporation

Record Type:	Language materials, printed : monographic
Paralel Title:	Deposition and characterization of ti-si-n, ti-si-c-n films by cathodic arc plasma evaporation
Author:	陳君濠,
Secondary Intellectual Responsibility:	蔡丕椿,
Place of Publication:	雲林縣
Published:	國立虎尾科技大學;
Year of Publication:	民98[2009]
Edition:	初版
Description:	159面圖 : 30公分;
Subject:	氮化鈦矽
Subject:	碳氮化鈦矽
Subject:	陰極電弧電漿蒸鍍
Subject:	Ti-Si-C-N
Subject:	Ti-Si-N
Subject:	cathodic arc plasma evaporation
Online resource:	http://cetd.lib.nfu.edu.tw/etdservice/view_metadata?etdun=U0028-2707200913491800

陰極電弧電漿沉積Ti-Si-N、Ti-Si-C-N薄膜及特性研究 = Deposition and characterization of ti-si-n, ti-si-c-n films by cathodic arc plasma evaporation
陳, 君濠

陰極電弧電漿沉積Ti-Si-N、Ti-Si-C-N薄膜及特性研究 = Deposition and characterization of ti-si-n, ti-si-c-n films by cathodic arc plasma evaporation / 陳君濠撰 - 初版. - 雲林縣 : 國立虎尾科技大學, 民98[2009]. - 159面 ; 圖 ; 30公分.
含參考書目.
氮化鈦矽碳氮化鈦矽陰極電弧電漿蒸鍍Ti-Si-C-NTi-Si-Ncathodic arc plasma evaporation

蔡, 丕椿

陰極電弧電漿沉積Ti-Si-N、Ti-Si-C-N薄膜及特性研究 = Deposition and characterization of ti-si-n, ti-si-c-n films by cathodic arc plasma evaporation
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328 $a 碩士論文--國立虎尾科技大學材料科學與綠色能源工程研究所
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