氮化鋁鎵/氮化鎵高電子遷移率電晶體之製作與研究 = Fabricatio...
林義, {E5B3AF}

 

  • 氮化鋁鎵/氮化鎵高電子遷移率電晶體之製作與研究 = Fabrication and study of algan/gan high electron mobility transistor
  • Record Type: Language materials, printed : monographic
    Paralel Title: Fabrication and study of algan/gan high electron mobility transistor
    Author: 林義{E5B3AF},
    Secondary Intellectual Responsibility: 陳文瑞,
    Place of Publication: 雲林縣
    Published: 國立虎尾科技大學;
    Year of Publication: 民98[2009]
    Description: 90面圖 : 30公分;
    Subject: 氮化鎵
    Subject: 高電子遷移率電晶體
    Subject: GaN
    Subject: High Electron Mobility Transistor
    Online resource: http://cetd.lib.nfu.edu.tw/etdservice/view_metadata?etdun=U0028-1707200900001100
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