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黃家宏

Overview

Works:	1 works in 1 publications in 1 languages

Titles

電化學原子層沉積製備Ag和Ag(Cu)薄膜之特性研究 = = Preparation of Ag andAg(Cu) Thin Film by Electrochemical Atomic Layer Deposition / by: 黃家宏 (Language materials, printed)

Subjects

Ag(Cu) thin films. Electrochemical atomic layer deposition. Surface limited redox replacement. underpotential deposition. 欠電位沉積. 表面侷限氧化還原反應. 銀 & 銀銅薄膜. 電化學原子層沉積.

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