Wang, Guilei.
概要
| 作品: | 1 作品在 0 項出版品 0 種語言 | |
|---|---|---|
書目資訊
Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond
by:
Wang, Guilei.; SpringerLink (Online service)
(書目-語言資料,印刷品)
, [http://id.loc.gov/vocabulary/relators/aut]