Wang, Guilei.
概要
作品: | 0 作品在 0 項出版品 0 種語言 |
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書目資訊
Investigation on SiGe Selective Epitaxy for Source and Drain Engineering in 22 nm CMOS Technology Node and Beyond
by:
Wang, Guilei.; SpringerLink (Online service)
(書目-語言資料,印刷品)
, [http://id.loc.gov/vocabulary/relators/aut]