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陳坤煌
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Titles
調控鎳開路電位時間置換低電位沉積鈷製備鈷鎳合金薄膜特性 = = Co(Ni) Film Prepared by Controlling Open Circuit Potential Duration of Ni During Surface-limited Redox Replacement of the Underpotential Deposited Co /
by: 陳坤煌
(Language materials, printed)
Subjects
Co(Ni) alloy films.
EC-ALD.
Interconnects.
Surface-Limited Redox Reaction.
Underpotential Deposition.
低電位沉積.
表面侷限氧化還原置換.
連導線.
鈷鎳合金薄膜.
電化學原子層沉積.
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