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Pattern Recognition. ICPR Internatio...
~
Bertini, Marco.
Pattern Recognition. ICPR International Workshops and Challenges = Virtual Event, January 10–15, 2021, Proceedings, Part III /
紀錄類型:
書目-語言資料,印刷品 : Monograph/item
正題名/作者:
Pattern Recognition. ICPR International Workshops and Challenges/ edited by Alberto Del Bimbo, Rita Cucchiara, Stan Sclaroff, Giovanni Maria Farinella, Tao Mei, Marco Bertini, Hugo Jair Escalante, Roberto Vezzani.
其他題名:
Virtual Event, January 10–15, 2021, Proceedings, Part III /
其他作者:
Vezzani, Roberto.
面頁冊數:
XXI, 767 p. 23 illus.online resource. :
Contained By:
Springer Nature eBook
標題:
Computing Milieux. -
電子資源:
https://doi.org/10.1007/978-3-030-68796-0
ISBN:
9783030687960
Pattern Recognition. ICPR International Workshops and Challenges = Virtual Event, January 10–15, 2021, Proceedings, Part III /
Pattern Recognition. ICPR International Workshops and Challenges
Virtual Event, January 10–15, 2021, Proceedings, Part III /[electronic resource] :edited by Alberto Del Bimbo, Rita Cucchiara, Stan Sclaroff, Giovanni Maria Farinella, Tao Mei, Marco Bertini, Hugo Jair Escalante, Roberto Vezzani. - 1st ed. 2021. - XXI, 767 p. 23 illus.online resource. - Image Processing, Computer Vision, Pattern Recognition, and Graphics ;12663. - Image Processing, Computer Vision, Pattern Recognition, and Graphics ;9219.
This 8-volumes set constitutes the refereed of the 25th International Conference on Pattern Recognition Workshops, ICPR 2020, held virtually in Milan, Italy and rescheduled to January 10 - 11, 2021 due to Covid-19 pandemic. The 416 full papers presented in these 8 volumes were carefully reviewed and selected from about 700 submissions. The 46 workshops cover a wide range of areas including machine learning, pattern analysis, healthcare, human behavior, environment, surveillance, forensics and biometrics, robotics and egovision, cultural heritage and document analysis, retrieval, and women at ICPR2020.
ISBN: 9783030687960
Standard No.: 10.1007/978-3-030-68796-0doiSubjects--Topical Terms:
669921
Computing Milieux.
LC Class. No.: TA1630-1650
Dewey Class. No.: 006.6
Pattern Recognition. ICPR International Workshops and Challenges = Virtual Event, January 10–15, 2021, Proceedings, Part III /
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