| Record Type: |
Language materials, printed
: Monograph/item
|
| Title/Author: |
Advances in pattern recognition and artificial intelligence / edited by Nicola Nobile, Marleah Blom, Ching Y. Suen./ |
| other author: |
Nobile, Nicola. |
| Published: |
Hackensack, NJ :World Scientific, : c2022., |
| Description: |
xv, 260 p. :ill. (some col.) ; : 24 cm.; |
| Notes: |
"This book includes reviewed papers by international scholars from the 2020 International Conference on Pattern Recognition and Artificial Intelligence (held online). The papers have been expanded to provide more details specifically for this book." -- P. [4] of cover. |
| Subject: |
Pattern recognition systems. - |
| ISBN: |
9789811239007 : |