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Gratings, photosensitivity, and poling in silica optical waveguides with 157-nm fluorine laser radiation.

Record Type:	Language materials, printed : Monograph/item
Title/Author:	Gratings, photosensitivity, and poling in silica optical waveguides with 157-nm fluorine laser radiation./
Author:	Chen, Peng (Kevin).
Published:	Ann Arbor : ProQuest Dissertations & Theses, : 2002,
Description:	175 p.
Notes:	Source: Dissertations Abstracts International, Volume: 64-10, Section: B.
Contained By:	Dissertations Abstracts International64-10B.
Subject:	Electrical engineering. -
Online resource:	http://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=NQ74632
ISBN:	9780612746329

Gratings, photosensitivity, and poling in silica optical waveguides with 157-nm fluorine laser radiation.
Chen, Peng (Kevin).

Gratings, photosensitivity, and poling in silica optical waveguides with 157-nm fluorine laser radiation. - Ann Arbor : ProQuest Dissertations & Theses, 2002 - 175 p.

Source: Dissertations Abstracts International, Volume: 64-10, Section: B.

Thesis (Ph.D.)--University of Toronto (Canada), 2002.

This item must not be sold to any third party vendors.

The energetic 7.9-eV photons of the F2 laser directly access bandgap states in germanosilicate glasses to drive one-photon processes for inducing strong refractive index changes in silica optical waveguides. In this thesis, the author carried out the first comprehensive F2-laser photosensitivity studies with an aim to assess prospects for shaping useful photonic structures directly inside the germanosilicate waveguides. Both planar waveguides and standard telecommunication fibers were examined. Large effective index change (>10−3) was induced in both fibers and planar waveguides without any enhancement technique. With the use of hydrogen loading enhancement, asymmetric refractive index profiles were noted by atomic force microscopy and microreflection microscopy, having a peak index change of larger than 0.01 in the fiber core. The 157-nm laser radiation is effective in rapidly forming long-period gratings in standard fibers. Grating formation is over 250 times faster than that with the 248-nm KrF laser constituting the fastest photosensitivity response ever reported. For planar lightwave circuits (PLCs), the 157-nm laser exposure generate narrow profiles of large index changes (Δn ∼ 10 −2) that is useful in trimming phase errors and controlling birefringence in frequency domain modulators (FDMs) and interleavers. The large vacuum-ultraviolet-induced birefringence was used to completely compensate the intrinsic birefringence of Δn ∼ 10−4 in typical PLCs. With hydrogen soaking, modest 157-nm pre-irradiation (accumulated fluence >3 J/cm2) was found to ‘lock-in’ a permanent photosensitivity enhancement in the germanosilica, permitting the formation of strong (40 dB) and stable fiber Bragg gratings with 248-nm-KrF laser light. The F2-laser photosensitivity locking was 300-time more effective than with KrF-laser pretreatment. The practical trimming applications in PLCs were demonstrated in PLC interleavers and FDMs. The 157-nm laser pre-radiation was found to have a modest enhancement on the thermal poling process. Thermal poling on 157-nm and 248-nm pre-treated Er/B ring twin-hole fibers showed a 100% enhancement on the residential electro-optical coefficient (0.2 pm/V) in comparison with untreated fibers. The 3rd -order nonlinearity for the thermal poling was also enhanced by both 157-nm and 248-nm pre-radiation. A 2.7-time increase of the 3rd nonlinearity was observed in both 157-nm pre-treated fibers. The results of this thesis have potentials applications for laser writing and trimming of telecommunication optical components.

ISBN: 9780612746329Subjects--Topical Terms:

596380
Electrical engineering.
Subjects--Index Terms:

Fluorine lasers

Gratings, photosensitivity, and poling in silica optical waveguides with 157-nm fluorine laser radiation.
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245 1 0 $a Gratings, photosensitivity, and poling in silica optical waveguides with 157-nm fluorine laser radiation.
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300 $a 175 p.
500 $a Source: Dissertations Abstracts International, Volume: 64-10, Section: B.
500 $a Publisher info.: Dissertation/Thesis.
500 $a Advisor: Herman, Peter R.
502 $a Thesis (Ph.D.)--University of Toronto (Canada), 2002.
506 $a This item must not be sold to any third party vendors.
506 $a This item must not be added to any third party search indexes.
520 $a The energetic 7.9-eV photons of the F2 laser directly access bandgap states in germanosilicate glasses to drive one-photon processes for inducing strong refractive index changes in silica optical waveguides. In this thesis, the author carried out the first comprehensive F2-laser photosensitivity studies with an aim to assess prospects for shaping useful photonic structures directly inside the germanosilicate waveguides. Both planar waveguides and standard telecommunication fibers were examined. Large effective index change (>10−3) was induced in both fibers and planar waveguides without any enhancement technique. With the use of hydrogen loading enhancement, asymmetric refractive index profiles were noted by atomic force microscopy and microreflection microscopy, having a peak index change of larger than 0.01 in the fiber core. The 157-nm laser radiation is effective in rapidly forming long-period gratings in standard fibers. Grating formation is over 250 times faster than that with the 248-nm KrF laser constituting the fastest photosensitivity response ever reported. For planar lightwave circuits (PLCs), the 157-nm laser exposure generate narrow profiles of large index changes (Δn ∼ 10 −2) that is useful in trimming phase errors and controlling birefringence in frequency domain modulators (FDMs) and interleavers. The large vacuum-ultraviolet-induced birefringence was used to completely compensate the intrinsic birefringence of Δn ∼ 10−4 in typical PLCs. With hydrogen soaking, modest 157-nm pre-irradiation (accumulated fluence >3 J/cm2) was found to ‘lock-in’ a permanent photosensitivity enhancement in the germanosilica, permitting the formation of strong (40 dB) and stable fiber Bragg gratings with 248-nm-KrF laser light. The F2-laser photosensitivity locking was 300-time more effective than with KrF-laser pretreatment. The practical trimming applications in PLCs were demonstrated in PLC interleavers and FDMs. The 157-nm laser pre-radiation was found to have a modest enhancement on the thermal poling process. Thermal poling on 157-nm and 248-nm pre-treated Er/B ring twin-hole fibers showed a 100% enhancement on the residential electro-optical coefficient (0.2 pm/V) in comparison with untreated fibers. The 3rd -order nonlinearity for the thermal poling was also enhanced by both 157-nm and 248-nm pre-radiation. A 2.7-time increase of the 3rd nonlinearity was observed in both 157-nm pre-treated fibers. The results of this thesis have potentials applications for laser writing and trimming of telecommunication optical components.
590 $a School code: 0779.
650 4 $a Electrical engineering. $3 596380
650 4 $a Optics. $3 595336
653 $a Fluorine lasers
653 $a Gratings
653 $a Laser radiation
653 $a Optical waveguides
653 $a Photosensitivity
653 $a Poling
653 $a Silica
690 $a 0544
690 $a 0752
710 2 $a University of Toronto (Canada). $3 1182602
773 0 $t Dissertations Abstracts International $g 64-10B.
790 $a 0779
791 $a Ph.D.
792 $a 2002
793 $a English
856 4 0 $u http://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=NQ74632