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Nanofabrication = principles, capabilities and limits /

紀錄類型:	書目-語言資料,印刷品 : Monograph/item
正題名/作者:	Nanofabrication/ by Zheng Cui.
其他題名:	principles, capabilities and limits /
作者:	Cui, Zheng.
出版者:	Cham :Springer International Publishing : : 2024.,
面頁冊數:	xi, 413 p. :ill. (some col.), digital ; : 24 cm.;
Contained By:	Springer Nature eBook
標題:	Electronics and Microelectronics, Instrumentation. -
電子資源:	https://doi.org/10.1007/978-3-031-62546-6
ISBN:	9783031625466

Nanofabrication = principles, capabilities and limits /
Cui, Zheng.

Nanofabricationprinciples, capabilities and limits /[electronic resource] :by Zheng Cui. - Third edition. - Cham :Springer International Publishing :2024. - xi, 413 p. :ill. (some col.), digital ;24 cm.

Chapter 1. Introduction -- Chapter 2. Optical lithography -- Chapter 3. Electron beam lithography -- Chapter 4. Nanofabrication by focused ion beam -- Chapter 5. Tip-based nanofabrication -- Chapter 6. Nanoimprinting lithography -- Chapter 7. Nanoscale pattern transfer by etching -- Chapter 8. Nanoscale pattern transfer by deposition -- Chapter 9. Indirect nanofabrication -- Chapter 10. Nanofabrication by self-assembly -- Chapter 11. Applications of nanofabrication -- Chapter 9. Policing and investigating criminal activities by gangs using e-bikes, e-scooters and e-motorcycles in the United Kingdom -- Part IV-Police and Community Outreach and Collaboration. -- Chapter 10. Initiatives to improve Police - Community Collaboration and Trust -- Chapter 11. Understanding the Implementation of Community-oriented Policing in the New Zealand Police.

Nanofabrication: Principles, Capabilities, and Limits provides a practical guide to nanofabrication technologies and processes. It was first published in 2008 and is now in an updated third edition. The book introduces readers to the fundamentals and recent developments in nanofabrication techniques, with chapters covering optical lithography, electron beam lithography, and nanoimprinting lithography, as well as nanofabrication by focused ion beams, scanning tips, self-assembly, and nanoscale pattern transfer by etching and deposition. There is also a chapter describing various tricks that enable the fabrication of nanostructures that would otherwise be impossible using traditional methods. The unique feature of this book is that each technique introduced is not only about its capabilities but also its limits so that the readers are fully aware of the best options to choose from a toolbox of nanofabrication processes covered in the book. Contains most of the nanofabrication techniques encountered in both industrial applications and scientific research; Presents less theoretical and more practical information and examples from the author's own work and the literature; Provides comprehensive illustrations to help understand lithography techniques using the author's simulation programs.

ISBN: 9783031625466

Standard No.: 10.1007/978-3-031-62546-6doiSubjects--Topical Terms:

670219
Electronics and Microelectronics, Instrumentation.

LC Class. No.: T174.7

Dewey Class. No.: 620.5

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520 $a Nanofabrication: Principles, Capabilities, and Limits provides a practical guide to nanofabrication technologies and processes. It was first published in 2008 and is now in an updated third edition. The book introduces readers to the fundamentals and recent developments in nanofabrication techniques, with chapters covering optical lithography, electron beam lithography, and nanoimprinting lithography, as well as nanofabrication by focused ion beams, scanning tips, self-assembly, and nanoscale pattern transfer by etching and deposition. There is also a chapter describing various tricks that enable the fabrication of nanostructures that would otherwise be impossible using traditional methods. The unique feature of this book is that each technique introduced is not only about its capabilities but also its limits so that the readers are fully aware of the best options to choose from a toolbox of nanofabrication processes covered in the book. Contains most of the nanofabrication techniques encountered in both industrial applications and scientific research; Presents less theoretical and more practical information and examples from the author's own work and the literature; Provides comprehensive illustrations to help understand lithography techniques using the author's simulation programs.
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