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Photon sources for lithography and metrology

紀錄類型:	書目-語言資料,印刷品 : Monograph/item
正題名/作者:	Photon sources for lithography and metrology / Vivek Bakshi, editor.
其他作者:	Bakshi, Vivek,
面頁冊數:	1 online resource (li, 1250 pages) :illustrations. :
標題:	Extreme ultraviolet lithography. -
電子資源:	https://dx.doi.org/10.1117/3.2638242
ISBN:	9781510653726

Photon sources for lithography and metrology
Photon sources for lithography and metrology [electronic resource] /Vivek Bakshi, editor. - 1 online resource (li, 1250 pages) :illustrations. - SPIE Press monograph ;PM351. - SPIE Digital Library..

Includes bibliographical references and index.

Photon source technology for lithography and metrology : an overview / Vivek Bakshi -- Laser-produced plasma sources for short-wavelength applications including lithography and microscopy / Gerry O'Sullivan, Padraig Dunne, Takeshi Higashiguchi, Takanori Miyazaki, Fergal O'Reilly, and Emma Sokell -- Radiation-hydrodynamics modeling of LPP EUV sources / Howard Scott, Steve Langer, and Yechiel Frank -- Atomic origins of EUV light / John Sheil, James Colgan, and Oscar Versolato -- Radiation-dominated plasma in LPP sources : physical aspects and challenges for numerical modeling / Mikhail M. Basko -- EUV sources for high-volume manufacturing / Igor Fomenko, David C. Brandt, Alexander I. Ershov, Alexander A. Schafgans, Yezheng Tao, Georgiy O. Vaschenko, and Bruno La Fontaine -- EUV light source for lithography / Hakaru Mizoguchi, Shinji Nagai, Takashi Suganuma, Georg Soumagne, Hiroaki Nakarai, Yoshufumi Ueno, Takashi Saitou, and Tatsuya Yanagida -- The electrodeless Z-pinch metrology source / Stephen Horne, Deborah Gustafson, Matthew J. Partlow, Wolfram Neff, Michael Roderick, and Kosuke Saito -- High-brightness laser-assisted discharge-produced plasma EUV source for mask inspection and exposure applications / Yusuke Teramoto -- Compact EUV sources for metrology and irradiation experiments / Klaus Bergmann, Jochen Vieker, Alexander von Wezyk, and Florian Melsheimer -- The EUV lamp : a discharge-produced metrology EUV source / Rainer Lebert, Christoph Phiesel, Thomas Missalla, and Andreas Biermanns-F�oth -- Laser-driven plasma source technology and applications / Huiling Zhu, Toru Fujinami, Xiaohua Ye, Don McDaniel, and Deborah Gustafson -- EUV source metrology / Muharrem Bayraktar, Fei Liu, Oscar Versolato, and Fred Bijkerk -- Collector optics for EUV sources / Sascha Migura, Tobias M�uller, and Frank Hartung -- Grazing incidence optics and applications / Ladislav P�ina -- Materials processing with focused EUV/soft-X-ray pulses / Kazuyuki Sakaue -- Irreversible changes in materials exposed to EUV radiation / Libor Juha -- Interaction of intense EUV pulses with atomic and molecular gases / Andrzej Bartnik -- Plasma diagnostics / Kentaro Tomita -- Synchrotron-based metrology tools for EUV lithography / Charles Tarrio, Robert E. Vest, Frank Scholze, Michael Kolbe, and Yasin Ekinchi -- Tin mitigation in EUV sources / Gianluca Panici and David N. Ruzic -- Compact, efficient CO2 amplifiers with modular design for high-efficiency EUV power generation / Koji Yasui, Junichi Nishimae, Tatsuya Yamamoto, and Yuzuru Tadokoro -- Excimer lasers for lithography / Hakaru Mizoguchi, Osamu Wakabayashi, Toshihiro Oga, Hiroaki Nakarai, Hiroshi Komori, Kouji Kakizaki, and Junichi Fujimoto -- Coherent EUV light sources based on high-order harmonic generation sources : principles and applications in nanotechnology / Henry Kapteyn, Margaret M. Murnane, Yuka Esashi, Michael Tanksalvala, Joshua L. Knobloch, Chen-Ting Liao, Daniel D. Hickstein, Clayton Bargsten, Kevin Dorney, and John Petersen -- YAG lasers for lithography and metrology / Martin Smr�z, Ji�r�i Mu�zik, and Siva Sankar Nagisetty -- Solid state 2-[mu]m laser drivers for EUV lithography / Brendan A. Reagan, Thomas Galvin, Issa Tamer, Emily Sistrunk, Thomas Spinka, and Craig W. Siders -- Accelerators and compact storage rings for lithography and metrology / Yasin Ekinci, Terence Garvey, Andreas Streun, and Leonid Rivkin -- High-power light source for EUV lithography based on the energy-recovery linac free-electron laser / Hiroshi Kawata, Ryuokou Kato, Hiroshi Sakai, Norio Nakamura, and Ryoichi Hajima -- UV lamps for lithography / Hisakazu Ieuji.

Restricted to subscribers or individual electronic text purchasers.

"Photon sources enable the extension of lithography and metrology technologies for continued scaling of circuit elements and therefore are the key drivers for the extension of Moore's law. This comprehensive, 28-chapter volume is the authoritative reference on photon source technology and includes contributions from leading researchers and suppliers in the photon source field. It is intended to meet the needs of both practitioners of the technology and readers seeking a thorough introduction to EUV photon sources and their applications. Topics include a state-of-the-art overview and in-depth explanation of photons source requirements, fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPPs) and laser-produced plasmas (LPPs), a description of prominent DPP and LPP designs, and other technologies for producing EUV radiation at 13.5 nm. Additionally, this volume contains detailed descriptions of 193-nm excimer lasers, UV lamps, and laser-driven plasma sources for UV photons, all of which power many current lithography and metrology tools. CO2 lasers and 1-um Nd- YAG lasers, used for pre-pulse in Sn LPP EUV sources, are also covered. Alternative photon sources for 13.5-nm lithography and metrology, such as high-harmonic generation (HHG) and synchrotrons, along with their usage as a metrology tool, are discussed; and potential future photon sources such as free-electron lasers (FELs), solid-state 2-um thulium lasers, and 1-um Nd-YAG lasers are described. Additional topics include EUV source metrology, plasma diagnostics of EUV plasmas, grazing and normal incidence collector optics for plasma sources, debris mitigation, and mechanisms of component erosion in EUV sources"--

Mode of access: World Wide Web.

ISBN: 9781510653726

Standard No.: 10.1117/3.2638242doiSubjects--Topical Terms:

795569
Extreme ultraviolet lithography.
Index Terms--Genre/Form:

554714
Electronic books.

LC Class. No.: TK7872.M3 / P473 2023eb

Dewey Class. No.: 621.3815/31

Photon sources for lithography and metrology
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504 $a Includes bibliographical references and index.
505 0 # $a Photon source technology for lithography and metrology : an overview / Vivek Bakshi -- Laser-produced plasma sources for short-wavelength applications including lithography and microscopy / Gerry O'Sullivan, Padraig Dunne, Takeshi Higashiguchi, Takanori Miyazaki, Fergal O'Reilly, and Emma Sokell -- Radiation-hydrodynamics modeling of LPP EUV sources / Howard Scott, Steve Langer, and Yechiel Frank -- Atomic origins of EUV light / John Sheil, James Colgan, and Oscar Versolato -- Radiation-dominated plasma in LPP sources : physical aspects and challenges for numerical modeling / Mikhail M. Basko -- EUV sources for high-volume manufacturing / Igor Fomenko, David C. Brandt, Alexander I. Ershov, Alexander A. Schafgans, Yezheng Tao, Georgiy O. Vaschenko, and Bruno La Fontaine -- EUV light source for lithography / Hakaru Mizoguchi, Shinji Nagai, Takashi Suganuma, Georg Soumagne, Hiroaki Nakarai, Yoshufumi Ueno, Takashi Saitou, and Tatsuya Yanagida -- The electrodeless Z-pinch metrology source / Stephen Horne, Deborah Gustafson, Matthew J. Partlow, Wolfram Neff, Michael Roderick, and Kosuke Saito -- High-brightness laser-assisted discharge-produced plasma EUV source for mask inspection and exposure applications / Yusuke Teramoto -- Compact EUV sources for metrology and irradiation experiments / Klaus Bergmann, Jochen Vieker, Alexander von Wezyk, and Florian Melsheimer -- The EUV lamp : a discharge-produced metrology EUV source / Rainer Lebert, Christoph Phiesel, Thomas Missalla, and Andreas Biermanns-F�oth -- Laser-driven plasma source technology and applications / Huiling Zhu, Toru Fujinami, Xiaohua Ye, Don McDaniel, and Deborah Gustafson -- EUV source metrology / Muharrem Bayraktar, Fei Liu, Oscar Versolato, and Fred Bijkerk -- Collector optics for EUV sources / Sascha Migura, Tobias M�uller, and Frank Hartung -- Grazing incidence optics and applications / Ladislav P�ina -- Materials processing with focused EUV/soft-X-ray pulses / Kazuyuki Sakaue -- Irreversible changes in materials exposed to EUV radiation / Libor Juha -- Interaction of intense EUV pulses with atomic and molecular gases / Andrzej Bartnik -- Plasma diagnostics / Kentaro Tomita -- Synchrotron-based metrology tools for EUV lithography / Charles Tarrio, Robert E. Vest, Frank Scholze, Michael Kolbe, and Yasin Ekinchi -- Tin mitigation in EUV sources / Gianluca Panici and David N. Ruzic -- Compact, efficient CO2 amplifiers with modular design for high-efficiency EUV power generation / Koji Yasui, Junichi Nishimae, Tatsuya Yamamoto, and Yuzuru Tadokoro -- Excimer lasers for lithography / Hakaru Mizoguchi, Osamu Wakabayashi, Toshihiro Oga, Hiroaki Nakarai, Hiroshi Komori, Kouji Kakizaki, and Junichi Fujimoto -- Coherent EUV light sources based on high-order harmonic generation sources : principles and applications in nanotechnology / Henry Kapteyn, Margaret M. Murnane, Yuka Esashi, Michael Tanksalvala, Joshua L. Knobloch, Chen-Ting Liao, Daniel D. Hickstein, Clayton Bargsten, Kevin Dorney, and John Petersen -- YAG lasers for lithography and metrology / Martin Smr�z, Ji�r�i Mu�zik, and Siva Sankar Nagisetty -- Solid state 2-[mu]m laser drivers for EUV lithography / Brendan A. Reagan, Thomas Galvin, Issa Tamer, Emily Sistrunk, Thomas Spinka, and Craig W. Siders -- Accelerators and compact storage rings for lithography and metrology / Yasin Ekinci, Terence Garvey, Andreas Streun, and Leonid Rivkin -- High-power light source for EUV lithography based on the energy-recovery linac free-electron laser / Hiroshi Kawata, Ryuokou Kato, Hiroshi Sakai, Norio Nakamura, and Ryoichi Hajima -- UV lamps for lithography / Hisakazu Ieuji.
506 # $a Restricted to subscribers or individual electronic text purchasers.
520 # $a "Photon sources enable the extension of lithography and metrology technologies for continued scaling of circuit elements and therefore are the key drivers for the extension of Moore's law. This comprehensive, 28-chapter volume is the authoritative reference on photon source technology and includes contributions from leading researchers and suppliers in the photon source field. It is intended to meet the needs of both practitioners of the technology and readers seeking a thorough introduction to EUV photon sources and their applications. Topics include a state-of-the-art overview and in-depth explanation of photons source requirements, fundamental atomic data and theoretical models of EUV sources based on discharge-produced plasmas (DPPs) and laser-produced plasmas (LPPs), a description of prominent DPP and LPP designs, and other technologies for producing EUV radiation at 13.5 nm. Additionally, this volume contains detailed descriptions of 193-nm excimer lasers, UV lamps, and laser-driven plasma sources for UV photons, all of which power many current lithography and metrology tools. CO2 lasers and 1-um Nd- YAG lasers, used for pre-pulse in Sn LPP EUV sources, are also covered. Alternative photon sources for 13.5-nm lithography and metrology, such as high-harmonic generation (HHG) and synchrotrons, along with their usage as a metrology tool, are discussed; and potential future photon sources such as free-electron lasers (FELs), solid-state 2-um thulium lasers, and 1-um Nd-YAG lasers are described. Additional topics include EUV source metrology, plasma diagnostics of EUV plasmas, grazing and normal incidence collector optics for plasma sources, debris mitigation, and mechanisms of component erosion in EUV sources"-- $c Provided by publisher.
530 $a Also published in print version.
538 $a Mode of access: World Wide Web.
538 $a System requirements: Adobe Acrobat Reader.
588 $a Title from PDF title page (SPIE eBooks Website, viewed 2023-11-13)
650 # 0 $a Extreme ultraviolet lithography. $3 795569
650 # 0 $a Laser plasmas. $3 784481
650 # 0 $a Speckle metrology. $3 912762
650 # 0 $a Holography. $3 643412
650 # 0 $a Ultraviolet radiation $x Industrial applications. $3 874048
650 # 0 $a Lasers $x Industrial applications. $3 599798
655 # 0 $a Electronic books. $2 local $3 554714
700 1 # $a Bakshi, Vivek, $e editor. $3 1490861
710 2 # $a Society of Photo-optical Instrumentation Engineers, $e publisher. $3 1086967
776 0 # $i Print version: $z 9781510653719
830 0 $a SPIE Digital Library. $3 877386
830 0 $a SPIE Press monograph ; $v PM103. $3 877204
856 4 0 $3 SPIE $u https://dx.doi.org/10.1117/3.2638242