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Multi-Scale Alignment and Positioning System II

Record Type:	Language materials, printed : Monograph/item
Title/Author:	Multi-Scale Alignment and Positioning System II/ Ozkan Ozturk.
Author:	Ozturk, Ozkan,
Description:	1 electronic resource (170 pages)
Notes:	Source: Dissertations Abstracts International, Volume: 70-05, Section: B.
Contained By:	Dissertations Abstracts International70-05B.
Subject:	Mechanical engineering. -
Online resource:	http://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=3320970
ISBN:	9780549750123

Multi-Scale Alignment and Positioning System II
Ozturk, Ozkan,

Multi-Scale Alignment and Positioning System II [electronic resource] /Ozkan Ozturk. - 1 electronic resource (170 pages)

Source: Dissertations Abstracts International, Volume: 70-05, Section: B.

Multi-Scale Alignment Positioning System (MAPS) is a nano-precision stage with six degrees of freedom, a control system, and a module designed to perform nanoimprint lithography (NIL) on 50.8 mm silicon substrates. Modules for plasmonic imaging lithography (PIL) and field assisted parallel nano-assembly (FAPNA) and an atomic force microscope to perform surface topography measurements will be added later. The moving platform (platen) which carries the substrate on its vacuum chuck has lateral motion actuated by four Halbach linear motors embedded into the stationary base structure. The displacement is measured with 0.15 nanometer resolution by using double-pass heterodyne laser interferometers. The platen glides on a vacuum preloaded air bearing which is also embedded into the base structure to obtain frictionless motion and high stiffness in the Z direction. The air and vacuum is supplied to the wafer chucks through the stationary air bearing and holes through the platen to eliminate "umbilical cords." Mechanical damping in the lateral direction is obtained by copper plates moving in a magnetic field causing eddy currents to create force opposing the motion. An interchangeable module (such as an imprinting head) is held by the structural frame which also carries the interferometer optics. The module and the frame are coupled together using a special kind of kinematic coupling which is called a spherolinder®†. The frame and the module have 40μm Z travel fine motion provided by using three PZT actuators. Feedback for these actuators is provided by capacitance sensors with resolution less than a nanometer. The kinematic arrangement of PZT actuators allows correcting for pitch and roll. The z axis also has 1.5 mm coarse adjustment to compensate for thickness variations in the substrate and the stamp. MAPS is also capable of aligning the substrate and the stamp with sub-10nm accuracy by using a moiré fringe alignment technique. Moiré fringes are obtained by the two sets of different pitched alignment marks on both substrate and the stamp facing each other and observed by 20x infinity corrected objectives, relay optics and CCD cameras. A special kinematic actuator loading tool is used to load and align the substrate and stamp at a repeatable position so that the alignment marks can be kept in the field of view of the objectives to start the alignment process. The stamp is held on a pin chuck made out of fused silica in order to reduce deformation caused by contamination. The fused silica pin chuck also allows viewing the moiré fringes and UV light to pass through to cure the resist for NIL. † Spherolinder is a registered trademark of g2 engineering.

English

ISBN: 9780549750123Subjects--Topical Terms:

557493
Mechanical engineering.
Subjects--Index Terms:

Lithography

Multi-Scale Alignment and Positioning System II
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500 $a Publisher info.: Dissertation/Thesis.
500 $a Advisors: Hocken, Robert J. Committee members: Davies, Angela D.; Davies, Matthew A.; Saydam, Cem A.; Smith, Stuart T.
502 $b Ph.D. $c The University of North Carolina at Charlotte $d 2008.
520 # $a Multi-Scale Alignment Positioning System (MAPS) is a nano-precision stage with six degrees of freedom, a control system, and a module designed to perform nanoimprint lithography (NIL) on 50.8 mm silicon substrates. Modules for plasmonic imaging lithography (PIL) and field assisted parallel nano-assembly (FAPNA) and an atomic force microscope to perform surface topography measurements will be added later. The moving platform (platen) which carries the substrate on its vacuum chuck has lateral motion actuated by four Halbach linear motors embedded into the stationary base structure. The displacement is measured with 0.15 nanometer resolution by using double-pass heterodyne laser interferometers. The platen glides on a vacuum preloaded air bearing which is also embedded into the base structure to obtain frictionless motion and high stiffness in the Z direction. The air and vacuum is supplied to the wafer chucks through the stationary air bearing and holes through the platen to eliminate "umbilical cords." Mechanical damping in the lateral direction is obtained by copper plates moving in a magnetic field causing eddy currents to create force opposing the motion. An interchangeable module (such as an imprinting head) is held by the structural frame which also carries the interferometer optics. The module and the frame are coupled together using a special kind of kinematic coupling which is called a spherolinder®†. The frame and the module have 40μm Z travel fine motion provided by using three PZT actuators. Feedback for these actuators is provided by capacitance sensors with resolution less than a nanometer. The kinematic arrangement of PZT actuators allows correcting for pitch and roll. The z axis also has 1.5 mm coarse adjustment to compensate for thickness variations in the substrate and the stamp. MAPS is also capable of aligning the substrate and the stamp with sub-10nm accuracy by using a moiré fringe alignment technique. Moiré fringes are obtained by the two sets of different pitched alignment marks on both substrate and the stamp facing each other and observed by 20x infinity corrected objectives, relay optics and CCD cameras. A special kinematic actuator loading tool is used to load and align the substrate and stamp at a repeatable position so that the alignment marks can be kept in the field of view of the objectives to start the alignment process. The stamp is held on a pin chuck made out of fused silica in order to reduce deformation caused by contamination. The fused silica pin chuck also allows viewing the moiré fringes and UV light to pass through to cure the resist for NIL. † Spherolinder is a registered trademark of g2 engineering.
546 $a English
590 $a School code: 0694
650 # 4 $a Mechanical engineering. $3 557493
653 # # $a Lithography
653 # # $a Multiscale-alignment positioning
653 # # $a Nanoimprint
653 # # $a Positioning
690 $a 0548
710 2 # $a The University of North Carolina at Charlotte. $b Mechanical Engineering (PhD). $e degree granting institution. $3 1503608
720 1 $a Hocken, Robert J. $e degree supervisor.
773 0 # $t Dissertations Abstracts International $g 70-05B.
790 $a 0694
791 $a Ph.D.
792 $a 2008
856 4 0 $u http://pqdd.sinica.edu.tw/twdaoapp/servlet/advanced?query=3320970