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具雙正圓軌跡連桿機構之系統化設計 = On the systematic...
~
彭耀麟
具雙正圓軌跡連桿機構之系統化設計 = On the systematic design of mechanisms with double circles traces
紀錄類型:
書目-語言資料,印刷品 : 單行本
並列題名:
On the systematic design of mechanisms with double circles traces
作者:
彭耀麟,
其他作者:
謝龍昌,
其他團體作者:
國立虎尾科技大學
出版地:
雲林縣
出版者:
國立虎尾科技大學;
出版年:
民96[2007]
版本:
初版
面頁冊數:
112面圖,表 : 30公分;
標題:
8字形軌跡
標題:
Cam-linkage mechanisms
電子資源:
http://140.130.12.251/ETD-db/ETD-search-c/view_etd?URN=etd-0730107-200152
摘要註:
近年來我國光纖與半導體製程設備的需求越來越強,技術發展趨向高效能和高精度。兩者晶圓研磨時之研磨軌跡以兩個正圓所組成的8字形所能獲得平坦度與均勻度最佳,配合進給機構,更可提高研磨片的使用率。 本文首先針對可以產生8字形軌跡的現有三個研磨機構作軌跡、速度與加速度分析,並以曲率(κ)作目標函數,產出單交點與雙交點8字形軌跡的最佳化設計。 接著,以顏氏創意性機構設計方法,根據一般化規則,產出兩個新的凸輪連桿機構,可用來達到所期望的雙正圓軌跡。然後,根據幾何關係,推導出X、Y座標的從動件位移方程式,依照X、Y座標位移方程式及包絡線法,可求得X-凸輪與Y-凸輪的輪廓曲線。最後,完成工程設計與雛型機開發,用以驗證設計理論。本研究之成果可適用於各式研磨機、拋光機等光纖製程設備與半導體製程設備上,提升光纖與半導體相關產品的品質。 In recent year, the demands of optical fiber and semiconductor equipments of our country were more and more intensively. The technological development of them trend high performance and high precision. The wafer and optical connector polishing with polishing trace figure 8, which is formed by double circles , will obtain the best qualities of flatness and uniformity. For the 3 mechanism with figure 8 polishing trace, first, analyze the polish trace, velocity, and acceleration of the 3 mechanism which can produce polishing trace with figure 8. Then, taking the curvature as objection function, do the optimal design of the polishing trace with one or two intersection points. For the cam-linkage mechanism, first, based on the Yan’s creative mechanism design methodology, we synthesize 2 mechanism which probably can achieve expected double circle trace . Then, according to the geometric relationship, derive the displacement equations of X and Y coordinate. Then, based on the displacement equations of X and Y coordinate and envelope method, obtain the X-cam and Y-cam profiles. Finally, carry out the engineering design and produce one prototype to confirm the design theorm. The results of this paper can suitable for optical fiber and semiconductor equipments to promote the product qualities.
具雙正圓軌跡連桿機構之系統化設計 = On the systematic design of mechanisms with double circles traces
彭, 耀麟
具雙正圓軌跡連桿機構之系統化設計
= On the systematic design of mechanisms with double circles traces / 彭耀麟撰 - 初版. - 雲林縣 : 國立虎尾科技大學, 民96[2007]. - 112面 ; 圖,表 ; 30公分.
8字形軌跡Cam-linkage mechanisms
謝, 龍昌
具雙正圓軌跡連桿機構之系統化設計 = On the systematic design of mechanisms with double circles traces
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近年來我國光纖與半導體製程設備的需求越來越強,技術發展趨向高效能和高精度。兩者晶圓研磨時之研磨軌跡以兩個正圓所組成的8字形所能獲得平坦度與均勻度最佳,配合進給機構,更可提高研磨片的使用率。 本文首先針對可以產生8字形軌跡的現有三個研磨機構作軌跡、速度與加速度分析,並以曲率(κ)作目標函數,產出單交點與雙交點8字形軌跡的最佳化設計。 接著,以顏氏創意性機構設計方法,根據一般化規則,產出兩個新的凸輪連桿機構,可用來達到所期望的雙正圓軌跡。然後,根據幾何關係,推導出X、Y座標的從動件位移方程式,依照X、Y座標位移方程式及包絡線法,可求得X-凸輪與Y-凸輪的輪廓曲線。最後,完成工程設計與雛型機開發,用以驗證設計理論。本研究之成果可適用於各式研磨機、拋光機等光纖製程設備與半導體製程設備上,提升光纖與半導體相關產品的品質。 In recent year, the demands of optical fiber and semiconductor equipments of our country were more and more intensively. The technological development of them trend high performance and high precision. The wafer and optical connector polishing with polishing trace figure 8, which is formed by double circles , will obtain the best qualities of flatness and uniformity. For the 3 mechanism with figure 8 polishing trace, first, analyze the polish trace, velocity, and acceleration of the 3 mechanism which can produce polishing trace with figure 8. Then, taking the curvature as objection function, do the optimal design of the polishing trace with one or two intersection points. For the cam-linkage mechanism, first, based on the Yan’s creative mechanism design methodology, we synthesize 2 mechanism which probably can achieve expected double circle trace . Then, according to the geometric relationship, derive the displacement equations of X and Y coordinate. Then, based on the displacement equations of X and Y coordinate and envelope method, obtain the X-cam and Y-cam profiles. Finally, carry out the engineering design and produce one prototype to confirm the design theorm. The results of this paper can suitable for optical fiber and semiconductor equipments to promote the product qualities.
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http://140.130.12.251/ETD-db/ETD-search-c/view_etd?URN=etd-0730107-200152
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