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Introduction to Surface and Thin Film Processes.

紀錄類型:	書目-語言資料,印刷品 : Monograph/item
正題名/作者:	Introduction to Surface and Thin Film Processes./
作者:	Venables, John A.
出版者:	Cambridge :Cambridge University Press, : 2000.,
面頁冊數:	390 p.
標題:	Thin films. -
電子資源:	Click here to view book
ISBN:	9780511035586 (electronic bk.)

Introduction to Surface and Thin Film Processes.
Venables, John A.

Introduction to Surface and Thin Film Processes.[electronic resource]. - Cambridge :Cambridge University Press,2000. - 390 p.

Cover; Half-title; Title; Copyright; Contents; Preface; 1 Introduction to surface processes; 2 Surfaces in vacuum: ultra-high vacuum techniques and processes; 3 Electron-based techniques for examining surface and thin film processes; 4 Surface processes in adsorption; 5 Surface processes in epitaxial growth; 6 Electronic structure and emission processes at metallic surfaces; 7 Semiconductor surfaces and interfaces; 8 Surface processes in thin film devices; 9 Postscript – where do we go from here?; Appendix A Bibliography; Appendix B List of acronyms; Appendix C Units and conversion factors

This book covers the experimental and theoretical background to surface and thin film processes, presenting extensive leads into practical and research literature, as well as to resources on the World Wide Web (see http://venables.asu.edu/book). Each chapter contains detailed problems. Suitable as a graduate textbook and sourcebook.

Electronic reproduction.

Available via World Wide Web.

Mode of access: World Wide Web.

ISBN: 9780511035586 (electronic bk.)Subjects--Topical Terms:

560219
Thin films.
Index Terms--Genre/Form:

554714
Electronic books.

LC Class. No.: QC176.83 .V46 2000eb

Dewey Class. No.: 530.4275

Introduction to Surface and Thin Film Processes.
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245 1 0 $a Introduction to Surface and Thin Film Processes. $h [electronic resource].
260 $a Cambridge : $c 2000. $b Cambridge University Press,
300 $a 390 p.
505 0 $a Cover; Half-title; Title; Copyright; Contents; Preface; 1 Introduction to surface processes; 2 Surfaces in vacuum: ultra-high vacuum techniques and processes; 3 Electron-based techniques for examining surface and thin film processes; 4 Surface processes in adsorption; 5 Surface processes in epitaxial growth; 6 Electronic structure and emission processes at metallic surfaces; 7 Semiconductor surfaces and interfaces; 8 Surface processes in thin film devices; 9 Postscript – where do we go from here?; Appendix A Bibliography; Appendix B List of acronyms; Appendix C Units and conversion factors
505 8 $a Appendix D Resources on the web or CD-ROMAppendix E Useful thermodynamic relationships; Appendix F Conductances and pumping speeds, C and S; Appendix G Materials for use in ultra-high vacuum; Appendix H UHV component cleaning procedures; Appendix J An outline of local density methods; Appendix K An outline of tight binding models; References; Index
520 $a This book covers the experimental and theoretical background to surface and thin film processes, presenting extensive leads into practical and research literature, as well as to resources on the World Wide Web (see http://venables.asu.edu/book). Each chapter contains detailed problems. Suitable as a graduate textbook and sourcebook.
533 $a Electronic reproduction. $n Available via World Wide Web.
538 $a Mode of access: World Wide Web.
650 4 $a Thin films. $3 560219
655 7 $a Electronic books. $2 local $3 554714
710 2 $a Ebooks Corporation. $3 683803
776 1 $z 9780521624602
856 4 0 $z Click here to view book $u http://nfu.cambridge.patron.eb20.com/Collections/ViewBook/23035077-8df8-4787-8cb4-6a8922f307cb#