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Advances in CMP/polishing technologi...
~
Kurokawa, Syuhei.
Advances in CMP/polishing technologies for the manufacture of electronic devices
紀錄類型:
書目-語言資料,印刷品 : Monograph/item
正題名/作者:
Advances in CMP/polishing technologies for the manufacture of electronic devices/ edited by Toshiro Doi, Ioan D. Marinescu, Syuhei Kurokawa.
其他作者:
Doi, Toshiro.
出版者:
Oxford :William Andrew, : 2012.,
面頁冊數:
1 online resource (xii, 317 p.)
附註:
Includes index.
標題:
Electrolytic polishing. -
電子資源:
http://www.sciencedirect.com/science/book/9781437778595
ISBN:
9781437778595
Advances in CMP/polishing technologies for the manufacture of electronic devices
Advances in CMP/polishing technologies for the manufacture of electronic devices
[electronic resource] /edited by Toshiro Doi, Ioan D. Marinescu, Syuhei Kurokawa. - 1st ed. - Oxford :William Andrew,2012. - 1 online resource (xii, 317 p.)
Includes index.
ISBN: 9781437778595Subjects--Topical Terms:
874130
Electrolytic polishing.
LC Class. No.: TS670 / .A386 2012eb
Dewey Class. No.: 671.7/2
Advances in CMP/polishing technologies for the manufacture of electronic devices
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http://www.sciencedirect.com/science/book/9781437778595
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