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Field guide to optical lithography

紀錄類型:	書目-語言資料,印刷品 : Monograph/item
正題名/作者:	Field guide to optical lithography/ Chris A. Mack.
其他題名:	Optical lithography.
作者:	Mack, Chris A.
出版者:	Bellingham, Wash. (1000 20th St. Bellingham WA 98225-6705 USA) :SPIE, : 2006.,
面頁冊數:	1 online resource (xii, 122 p. : ill.) :digital file. :
附註:	"SPIE digital library."
標題:	Integrated circuits - Design and construction. -
電子資源:	http://dx.doi.org/10.1117/3.665802
ISBN:	9780819478214 (electronic)

Field guide to optical lithography
Mack, Chris A.

Field guide to optical lithography[electronic resource] /Optical lithography.Chris A. Mack. - Bellingham, Wash. (1000 20th St. Bellingham WA 98225-6705 USA) :SPIE,2006. - 1 online resource (xii, 122 p. : ill.) :digital file. - SPIE field guides ;FG06. - SPIE field guides ;v. FG02.

"SPIE digital library."

Includes bibliographical references and index.

Symbol glossary -- The lithography process -- Definition : semiconductor lithography -- Overview of the lithography Process -- Processing : substrate preparation -- Processing : photoresist spin coating -- Processing : post-apply bake -- Processing : alignment and exposure -- Processing : post-exposure bake -- Processing : development -- Processing : pattern transfer -- Image formation -- Maxwell's equations : the mathematics of light -- The plane wave and the phasor -- Basic imaging theory -- Diffraction -- Fraunhofer diffraction : examples -- The numerical aperture -- Fourier optics -- Spatial coherence and oblique illumination -- Partial coherence -- Aberrations -- Aberrations : the Zernike polynomial -- Aberrations : Zernike examples -- Chromatic aberration -- Horizontal-vertical (H-V) bias -- Defocus -- Flare -- Vector nature of light -- Polarization -- The optical invariant -- Immersion lithography : resolution -- Immersion lithography : depth of focus -- Imaging into a photoresist -- Standing waves: definition -- Standing waves: mathematics -- Fresnel reflectivity -- Swing curves -- Top antireflective coatings (TARC) -- Bottom antireflective coatings (BARC) -- Photoresist chemistry -- Novolak/DNQ resists -- Chemically amplified resists -- Absorption of light -- Photoresist bleaching and the Dill parameters -- Exposure kinetics -- Measuring the Dill ABC parameters -- Chemically amplified resist kinetics.

Restricted to subscribers or individual electronic text purchasers.

The material in this Field Guide is a distillation of material put together by Chris Mack over the past 20 years, including notes from his graduate-level lithography course at the University of Texas at Austin. This Field Guide details the lithography process, image formation, imaging onto a photoresist, photoresist chemistry, and lithography control and optimization. An introduction to next-generation lithographic technologies is also included, as well as an extensive lithography glossary and a summation of salient equations critical to anyone involved in the lithography industry.

Mode of access: World Wide Web.

ISBN: 9780819478214 (electronic)

Standard No.: 10.1117/3.665802doiSubjects--Topical Terms:

561265
Integrated circuits
--Design and construction.

LC Class. No.: TK7874 / .M195 2006e

Dewey Class. No.: 621.3815/31

Field guide to optical lithography
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245 1 0 $a Field guide to optical lithography $h [electronic resource] / $c Chris A. Mack.
246 3 0 $a Optical lithography.
260 $a Bellingham, Wash. (1000 20th St. Bellingham WA 98225-6705 USA) : $b SPIE, $c 2006.
300 $a 1 online resource (xii, 122 p. : ill.) : $b digital file.
490 1 $a SPIE field guides ; $v FG06
500 $a "SPIE digital library."
504 $a Includes bibliographical references and index.
505 0 $a Symbol glossary -- The lithography process -- Definition : semiconductor lithography -- Overview of the lithography Process -- Processing : substrate preparation -- Processing : photoresist spin coating -- Processing : post-apply bake -- Processing : alignment and exposure -- Processing : post-exposure bake -- Processing : development -- Processing : pattern transfer -- Image formation -- Maxwell's equations : the mathematics of light -- The plane wave and the phasor -- Basic imaging theory -- Diffraction -- Fraunhofer diffraction : examples -- The numerical aperture -- Fourier optics -- Spatial coherence and oblique illumination -- Partial coherence -- Aberrations -- Aberrations : the Zernike polynomial -- Aberrations : Zernike examples -- Chromatic aberration -- Horizontal-vertical (H-V) bias -- Defocus -- Flare -- Vector nature of light -- Polarization -- The optical invariant -- Immersion lithography : resolution -- Immersion lithography : depth of focus -- Imaging into a photoresist -- Standing waves: definition -- Standing waves: mathematics -- Fresnel reflectivity -- Swing curves -- Top antireflective coatings (TARC) -- Bottom antireflective coatings (BARC) -- Photoresist chemistry -- Novolak/DNQ resists -- Chemically amplified resists -- Absorption of light -- Photoresist bleaching and the Dill parameters -- Exposure kinetics -- Measuring the Dill ABC parameters -- Chemically amplified resist kinetics.
505 0 $a Diffusion in chemically amplified resists -- Acid loss mechanisms -- Post-apply bake effects -- Photoresist development kinetics -- Surface inhibition -- Developer temperature and concentration -- The development path -- Lithography control and optimization -- NILS : the normalized image log-slope -- NILS : the log-slope defocus curve -- NILS : image optimization -- NILS : exposure optimization -- NILS : PEB optimization -- NILS : development optimization -- NILS : total Process optimization -- Defining photoresist linewidth -- Critical dimension control -- Critical dimension control : effect on devices -- Overlay control -- Line edge roughness -- Metrology : critical dimension -- Metrology : overlay -- The process window -- Depth of focus -- Resolution -- Rayleigh criteria : resolution -- Rayleigh criteria : depth of focus -- Mask error enhancement factor (MEEF) -- Resolution enhancement technologies -- Phase-shift masks -- Phase-shift masks : alternating -- Phase-shift masks : attenuated -- Optical proximity effects -- Optical proximity correction (OPC) -- Off-axis illumination -- Lithography simulation -- Moore's law -- Next-generation lithography (NGL) -- Equation summary -- Glossary -- Index.
506 $a Restricted to subscribers or individual electronic text purchasers.
520 $a The material in this Field Guide is a distillation of material put together by Chris Mack over the past 20 years, including notes from his graduate-level lithography course at the University of Texas at Austin. This Field Guide details the lithography process, image formation, imaging onto a photoresist, photoresist chemistry, and lithography control and optimization. An introduction to next-generation lithographic technologies is also included, as well as an extensive lithography glossary and a summation of salient equations critical to anyone involved in the lithography industry.
530 $a Also available in print version.
538 $a Mode of access: World Wide Web.
538 $a System requirements: Adobe Acrobat Reader.
650 0 $a Integrated circuits $x Design and construction. $3 561265
650 0 $a Microlithography. $3 562355
710 2 $a Society of Photo-optical Instrumentation Engineers. $3 700253
830 0 $a SPIE field guides ; $v v. FG02 $3 797522
856 4 0 $u http://dx.doi.org/10.1117/3.665802