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Lithography process control

Record Type:	Language materials, printed : Monograph/item
Title/Author:	Lithography process control/ Harry J. Levinson.
Author:	Levinson, Harry J.
Published:	Bellingham, Wash. (1000 20th St. Bellingham WA 98225-6705 USA) :SPIE, : c1999.,
Description:	1 online resource (x, 190 p. : ill.) :digital file. :
Notes:	"SPIE digital library."
Subject:	Semiconductors - Etching. -
Online resource:	http://dx.doi.org/10.1117/3.322162
ISBN:	9780819478559 (electronic)

Lithography process control
Levinson, Harry J.

Lithography process control[electronic resource] /Harry J. Levinson. - Bellingham, Wash. (1000 20th St. Bellingham WA 98225-6705 USA) :SPIE,c1999. - 1 online resource (x, 190 p. : ill.) :digital file. - Tutorial texts in optical engineering ;v. TT 28. - SPIE tutorial texts ;TT06..

"SPIE digital library."

Includes bibliographical references (p. 169-188) and index.

1. Introduction to the use of statistical process control in lithography -- The assumptions underlying statistical process control -- The properties of statistical process control -- Situations in lithography where statistical process control cannot be applied naively -- Non-normal distributions -- Process capability -- 2. Sampling -- Choosing the proper sample size -- Measurement location considerations -- Correlations -- Measurement frequency -- Systematic sources of variation -- 3. Simple and complex processes -- Definitions -- Why test wafers are useful -- How to address complex processes in lithography -- Distinguishing between layer-specific and equipment-specific effects -- 4. Linewidth control -- Cause and effect -- Independent variables -- Exposure dose -- Resist thickness -- Focus -- Bake temperatures -- Resist development -- Humidity -- DUV resists--special considerations -- Contributions from reticles -- Maximizing the process window -- 5. Overlay -- Overlay models -- Matching -- Contributions from processing and alignment mark optimization -- Addressing the problem of non-normal distributions -- Outliers -- 6. Yield -- Yield monitor strategy -- Yield models -- Parameters which affect yield -- 7. Process drift and automatic process control -- Adjusting for process drift -- The exponentially-weighted moving average -- Automatic process control -- 8. Metrology -- The need for understanding the measurement process: defect detection -- Linewidth measurement using scanning electron microscopes -- Electrical linewidth measurement -- Measurement error budgets -- Measurement of overlay -- 9. Control of operations -- Self-control -- Documentation -- ISO 9000.

Restricted to subscribers or individual electronic text purchasers.

This text covers lithography process control at several levels, from fundamental through advanced topics. The book is a self-contained tutorial that works both as an introduction to the technology and as a reference for the experienced lithographer. It reviews the foundations of statistical process control as background for advanced topics such as complex processes and feedback. In addition, it presents control methodologies that may be applied to process development pilot lines.

System requirements: Adobe Acrobat Reader.

ISBN: 9780819478559 (electronic)

Standard No.: 10.1117/3.322162doiSubjects--Topical Terms:

877240
Semiconductors
--Etching.

LC Class. No.: TK7871.85 / .L464 1999e

Dewey Class. No.: 621.3815/2

Lithography process control
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020 $a 9780819478559 (electronic)
020 $z 0819430528 (print)
020 $z 9780819430526 (print)
024 7 $a 10.1117/3.322162 $2 doi
035 $a (OCoLC)435970881
035 $a (CaBNVSL)gtp00535530
035 $a 9780819478559
040 $a CaBNVSL $c CaBNVSL $d CaBNVSL
050 4 $a TK7871.85 $b .L464 1999e
082 0 4 $a 621.3815/2 $2 21
100 1 $a Levinson, Harry J. $3 877218
245 1 0 $a Lithography process control $h [electronic resource] / $c Harry J. Levinson.
260 $a Bellingham, Wash. (1000 20th St. Bellingham WA 98225-6705 USA) : $b SPIE, $c c1999.
300 $a 1 online resource (x, 190 p. : ill.) : $b digital file.
490 1 $a Tutorial texts in optical engineering ; $v v. TT 28
500 $a "SPIE digital library."
504 $a Includes bibliographical references (p. 169-188) and index.
505 0 $a 1. Introduction to the use of statistical process control in lithography -- The assumptions underlying statistical process control -- The properties of statistical process control -- Situations in lithography where statistical process control cannot be applied naively -- Non-normal distributions -- Process capability -- 2. Sampling -- Choosing the proper sample size -- Measurement location considerations -- Correlations -- Measurement frequency -- Systematic sources of variation -- 3. Simple and complex processes -- Definitions -- Why test wafers are useful -- How to address complex processes in lithography -- Distinguishing between layer-specific and equipment-specific effects -- 4. Linewidth control -- Cause and effect -- Independent variables -- Exposure dose -- Resist thickness -- Focus -- Bake temperatures -- Resist development -- Humidity -- DUV resists--special considerations -- Contributions from reticles -- Maximizing the process window -- 5. Overlay -- Overlay models -- Matching -- Contributions from processing and alignment mark optimization -- Addressing the problem of non-normal distributions -- Outliers -- 6. Yield -- Yield monitor strategy -- Yield models -- Parameters which affect yield -- 7. Process drift and automatic process control -- Adjusting for process drift -- The exponentially-weighted moving average -- Automatic process control -- 8. Metrology -- The need for understanding the measurement process: defect detection -- Linewidth measurement using scanning electron microscopes -- Electrical linewidth measurement -- Measurement error budgets -- Measurement of overlay -- 9. Control of operations -- Self-control -- Documentation -- ISO 9000.
506 $a Restricted to subscribers or individual electronic text purchasers.
520 $a This text covers lithography process control at several levels, from fundamental through advanced topics. The book is a self-contained tutorial that works both as an introduction to the technology and as a reference for the experienced lithographer. It reviews the foundations of statistical process control as background for advanced topics such as complex processes and feedback. In addition, it presents control methodologies that may be applied to process development pilot lines.
530 $a Also available in print version.
538 $a System requirements: Adobe Acrobat Reader.
538 $a Mode of access: World Wide Web.
650 0 $a Semiconductors $x Etching. $3 877240
650 0 $a Microlithography $x Quality control. $3 877249
710 2 $a Society of Photo-optical Instrumentation Engineers. $3 700253
830 0 $a SPIE tutorial texts ; $v TT06. $3 877241
856 4 0 $u http://dx.doi.org/10.1117/3.322162