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Optical imaging in projection microlithography

Record Type:	Language materials, printed : Monograph/item
Title/Author:	Optical imaging in projection microlithography/ Alfred Kwok-Kit Wong.
Author:	Wong, Alfred Kwok-Kit.
Published:	Bellingham, Wash. (1000 20th St. Bellingham WA 98225-6705 USA) :SPIE, : c2005.,
Description:	1 online resource (xix, 254 p. : ill.) :digital file. :
Notes:	"SPIE digital library."
Subject:	Microlithography. -
Online resource:	http://dx.doi.org/10.1117/3.612961
ISBN:	9780819478702 (electronic)

Optical imaging in projection microlithography
Wong, Alfred Kwok-Kit.

Optical imaging in projection microlithography[electronic resource] /Alfred Kwok-Kit Wong. - Bellingham, Wash. (1000 20th St. Bellingham WA 98225-6705 USA) :SPIE,c2005. - 1 online resource (xix, 254 p. : ill.) :digital file. - Tutorial texts in optical engineering ;v. TT66. - SPIE tutorial texts ;TT06..

"SPIE digital library."

Includes bibliographical references (p. 219-229) and index.

1. Basic electromagnetism. 1.1. Maxwell's equations -- 1.2. Electromagnetic energy -- 1.3. The wave equation -- 1.4. Plane waves -- 1.5. Spherical waves -- 1.6. Harmonic waves -- 1.7. Quasi-monochromatic light.

Restricted to subscribers or individual electronic text purchasers.

Here for the first time is an integrated mathematical view of the physics and numerical modeling of optical projection lithography that efficiently covers the full spectrum of the important concepts. Alfred Wong offers rigorous underpinning, clarity in systematic formulation, physical insight into emerging ideas, as well as a system-level view of the parameter tolerances required in manufacturing. Readers with a good working knowledge of calculus can follow the step-by-step development, and technologists can gather general concepts and the key equations that result. Even the casual reader will gain a perspective on the key concepts, which will likely help facilitate dialog among technologists.

Mode of access: World Wide Web.

ISBN: 9780819478702 (electronic)

Standard No.: 10.1117/3.612961doiSubjects--Topical Terms:

562355
Microlithography.

LC Class. No.: TK7836 / .W66 2005e

Dewey Class. No.: 621.3815/31

Optical imaging in projection microlithography
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007 cr bn |||m|||a
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020 $a 9780819478702 (electronic)
020 $z 0819458295 (print)
020 $z 9780819458292 (print)
024 7 $a 10.1117/3.612961 $2 doi
035 $a (OCoLC)435971863
035 $a (CaBNVSL)gtp00535576
035 $a 9780819478702
040 $a CaBNVSL $c CaBNVSL $d CaBNVSL
050 4 $a TK7836 $b .W66 2005e
082 0 4 $a 621.3815/31 $2 22
100 1 $a Wong, Alfred Kwok-Kit. $3 877258
245 1 0 $a Optical imaging in projection microlithography $h [electronic resource] / $c Alfred Kwok-Kit Wong.
260 $a Bellingham, Wash. (1000 20th St. Bellingham WA 98225-6705 USA) : $b SPIE, $c c2005.
300 $a 1 online resource (xix, 254 p. : ill.) : $b digital file.
490 1 $a Tutorial texts in optical engineering ; $v v. TT66
500 $a "SPIE digital library."
504 $a Includes bibliographical references (p. 219-229) and index.
505 0 $a 1. Basic electromagnetism. 1.1. Maxwell's equations -- 1.2. Electromagnetic energy -- 1.3. The wave equation -- 1.4. Plane waves -- 1.5. Spherical waves -- 1.6. Harmonic waves -- 1.7. Quasi-monochromatic light.
505 0 $a 2. Elements of geometrical optics. 2.1. The eikonal equation -- 2.2. Light rays -- 2.3. Snell's law -- 2.4. Thin lens -- 2.5. Representation of an exposure system.
505 0 $a 3. Elements of diffraction theory. 3.1. Qualitative consideration -- 3.2. Reciprocity -- 3.3. The Helmholtz-Kirchhoff theorem -- 3.4. Fresnel-Kirchhoff diffraction -- 3.5. The Rayleigh-Sommerfeld diffraction formula -- 3.6. Fraunhofer diffraction -- 3.7. Fraunhofer diffraction patterns.
505 0 $a 4. Imaging of extended objects with finite sources. 4.1. Coherent illumination -- 4.2. Obliquity factor -- 4.3. Spatial correlation of light -- 4.4. K�ohler's illumination method -- 4.5. Partially coherent imaging.
505 0 $a 5. Resolution and image enhancement. 5.1. Image intensity spectrum -- 5.2. Binary intensity objects under on-axis illumination -- 5.3. Off-axis illumination -- 5.4. Attenuated phase-shifting mask -- 5.5. Alternating phase-shifting mask -- 5.6. Minimum half-pitch -- 5.7. Minimum dimension.
505 0 $a 6. Oblique rays. 6.1. Polarization -- 6.2. Vector imaging -- 6.3. Wave propagation across a dielectric interface -- 6.4. Stratified media -- 6.5. Intensity distribution in photoresist -- 6.6. Immersion imaging -- 6.7. Imaging with oblique rays.
505 0 $a 7. Aberrations. 7.1. Diffraction of an aberrated wavefront -- 7.2. General properties of the aberration function -- 7.3. Zernike polynomials -- 7.4. Effects on imaging -- 7.5. Measurement.
505 0 $a 8. Numerical computation. 8.1. Imaging equations -- 8.2. Transmission cross-coefficient integration -- 8.3. Source points integration -- 8.4. Coherent decomposition -- 8.5. Object spectrum -- 8.6. Remarks.
505 0 $a 9 Variabilities. 9.1. Categorization -- 9.2. Proximity effect -- 9.3. Object variabilities (photomask errors) -- 9.4. Polarization effects -- 9.5. Illumination -- 9.6. Pupil -- 9.7. Focus -- 9.8. Dose -- 9.9. Flare -- 9.10. Remarks.
505 0 $a A. Birefringence -- B. Stationarity and ergodicity -- C. Some Zernike polynomials -- D. Simulator accuracy tests -- E. Select refractive indexes -- F. Assorted theorems and identities -- Bibliography -- Solutions to exercises -- Index.
506 $a Restricted to subscribers or individual electronic text purchasers.
520 3 $a Here for the first time is an integrated mathematical view of the physics and numerical modeling of optical projection lithography that efficiently covers the full spectrum of the important concepts. Alfred Wong offers rigorous underpinning, clarity in systematic formulation, physical insight into emerging ideas, as well as a system-level view of the parameter tolerances required in manufacturing. Readers with a good working knowledge of calculus can follow the step-by-step development, and technologists can gather general concepts and the key equations that result. Even the casual reader will gain a perspective on the key concepts, which will likely help facilitate dialog among technologists.
530 $a Also available in print.
538 $a Mode of access: World Wide Web.
538 $a System requirements: Adobe Acrobat Reader.
588 $a Title from PDF t.p. (viewed on 8/32/09).
650 0 $a Microlithography. $3 562355
650 0 $a Imaging systems. $3 639186
710 2 $a Society of Photo-optical Instrumentation Engineers. $3 700253
830 0 $a SPIE tutorial texts ; $v TT06. $3 877241
856 4 0 $u http://dx.doi.org/10.1117/3.612961