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Optical scattering = measurement and analysis /

紀錄類型:	書目-語言資料,印刷品 : Monograph/item
正題名/作者:	Optical scattering/ John C. Stover.
其他題名:	measurement and analysis /
作者:	Stover, John C.
出版者:	Bellingham, Wash. (1000 20th St. Bellingham WA 98225-6705 USA) :SPIE, : 2012.,
面頁冊數:	1 online resource (xxiv, 302 p.) :ill., digital file. :
附註:	"SPIE Digital Library."--Website.
標題:	Light - Scattering. -
電子資源:	http://dx.doi.org/10.1117/3.975276
ISBN:	9780819492524 (electronic)

Optical scattering = measurement and analysis /
Stover, John C.

Optical scatteringmeasurement and analysis /[electronic resource] :John C. Stover. - 3rd ed. - Bellingham, Wash. (1000 20th St. Bellingham WA 98225-6705 USA) :SPIE,2012. - 1 online resource (xxiv, 302 p.) :ill., digital file. - SPIE Press monograph ;PM224. - SPIE Press monograph ;PM103..

"SPIE Digital Library."--Website.

Includes bibliographical references (p. 283-302).

Preface to the first edition -- Preface to the second edition -- Acknowledgments for the second edition -- Preface to the third edition -- Acknowledgments for the third edition -- List of acronyms -- Chapter 1. Quantifying light scatter -- Chapter 2. Quantifying surface roughness -- Chapter 3. Scatter calculations and diffraction theory -- Chapter 4. Using Rayleigh-Rice to calculate smooth-surface statistics from the BRDF -- Chapter 5. Polarization of scattered light -- Chapter 6. Scattering models for discrete surface features -- Chapter 7. Instrumentation and measurement issues -- Chapter 8. Predicting scatter from roughness -- Chapter 9. Detection of discrete defects -- Chapter 10. Appearance and scattered light -- Chapter 11. Industrial applications -- Chapter 12. Published scatter standards -- Chapter 13. Scatter specifications -- Appendix A. Review of electromagnetic wave propagation -- Appendix B. Kirchhoff diffraction from sinusoidal gratings -- Appendix C. BSDF data -- Appendix D. Units -- References -- Works consulted.

Restricted to subscribers or individual electronic text purchasers.

The first edition of this book concentrated on relating scatter from optically smooth surfaces to the microroughness on those surfaces. After spending six years in the semiconductor industry, Dr. Stover has updated and expanded the third edition. Newly included are scatter models for pits and particles as well as the use of wafer scanners to locate and size isolated surface features. New sections cover the multimillion-dollar wafer scanner business, establishing that microroughness is the noise, not the signal, in these systems. Scatter measurements, now routinely used to determine whether small-surface features are pits or particles and inspiring new technology that provides information on particle material, are also discussed. These new capabilities are now supported by a series of international standards, and a new chapter reviews those documents. New information on scatter from optically rough surfaces has also been added. Once the critical limit is exceeded, scatter cannot be used to determine surface-roughness statistics, but considerable information can still be obtained - especially when measurements are made on mass-produced products. Changes in measurement are covered, and the reader will find examples of scatter measurements made using a camera for a fraction of the cost and in a fraction of the time previously possible. The idea of relating scatter to surface appearance is also discussed, and appearance has its own short chapter. After all, beauty is in the eye of the beholder, and what we see is scattered light.

Mode of access: World Wide Web.

ISBN: 9780819492524 (electronic)

Standard No.: 10.1117/3.975276doiSubjects--Topical Terms:

639771
Light
--Scattering.Index Terms--Genre/Form:

554714
Electronic books.

LC Class. No.: QC427.4 / .S76 2012e

Dewey Class. No.: 535/.43

Optical scattering = measurement and analysis /
LDR:03997nam 2200385 a 4500 001 731128
003 SPIE
005 20120807123718.0
006 m e d
007 cr bn |||m|||a
008 130501s2012 waua fob 000 0 eng d
010 $z 2012017677
020 $a 9780819492524 (electronic)
020 $z 9780819492517 (print)
024 7 $a 10.1117/3.975276 $2 doi
035 $a (OCoLC)805233701
035 $a (CaBNVSL)gtp00552709
035 $a 9780819492524
040 $a CaBNVSL $c CaBNVSL $d CaBNVSL
050 4 $a QC427.4 $b .S76 2012e
082 0 4 $a 535/.43 $2 23
100 1 $a Stover, John C. $3 877206
245 1 0 $a Optical scattering $h [electronic resource] : $b measurement and analysis / $c John C. Stover.
250 $a 3rd ed.
260 $a Bellingham, Wash. (1000 20th St. Bellingham WA 98225-6705 USA) : $b SPIE, $c 2012.
300 $a 1 online resource (xxiv, 302 p.) : $b ill., digital file.
490 1 $a SPIE Press monograph ; $v PM224
500 $a "SPIE Digital Library."--Website.
504 $a Includes bibliographical references (p. 283-302).
505 0 $a Preface to the first edition -- Preface to the second edition -- Acknowledgments for the second edition -- Preface to the third edition -- Acknowledgments for the third edition -- List of acronyms -- Chapter 1. Quantifying light scatter -- Chapter 2. Quantifying surface roughness -- Chapter 3. Scatter calculations and diffraction theory -- Chapter 4. Using Rayleigh-Rice to calculate smooth-surface statistics from the BRDF -- Chapter 5. Polarization of scattered light -- Chapter 6. Scattering models for discrete surface features -- Chapter 7. Instrumentation and measurement issues -- Chapter 8. Predicting scatter from roughness -- Chapter 9. Detection of discrete defects -- Chapter 10. Appearance and scattered light -- Chapter 11. Industrial applications -- Chapter 12. Published scatter standards -- Chapter 13. Scatter specifications -- Appendix A. Review of electromagnetic wave propagation -- Appendix B. Kirchhoff diffraction from sinusoidal gratings -- Appendix C. BSDF data -- Appendix D. Units -- References -- Works consulted.
506 $a Restricted to subscribers or individual electronic text purchasers.
520 $a The first edition of this book concentrated on relating scatter from optically smooth surfaces to the microroughness on those surfaces. After spending six years in the semiconductor industry, Dr. Stover has updated and expanded the third edition. Newly included are scatter models for pits and particles as well as the use of wafer scanners to locate and size isolated surface features. New sections cover the multimillion-dollar wafer scanner business, establishing that microroughness is the noise, not the signal, in these systems. Scatter measurements, now routinely used to determine whether small-surface features are pits or particles and inspiring new technology that provides information on particle material, are also discussed. These new capabilities are now supported by a series of international standards, and a new chapter reviews those documents. New information on scatter from optically rough surfaces has also been added. Once the critical limit is exceeded, scatter cannot be used to determine surface-roughness statistics, but considerable information can still be obtained - especially when measurements are made on mass-produced products. Changes in measurement are covered, and the reader will find examples of scatter measurements made using a camera for a fraction of the cost and in a fraction of the time previously possible. The idea of relating scatter to surface appearance is also discussed, and appearance has its own short chapter. After all, beauty is in the eye of the beholder, and what we see is scattered light.
530 $a Also available in print version.
538 $a Mode of access: World Wide Web.
538 $a System requirements: Adobe Acrobat Reader.
588 $a Title from PDF title page (SPIE eBooks Website, viewed 2012-08-07).
650 0 $a Light $x Scattering. $3 639771
655 0 $a Electronic books. $2 local $3 554714
710 2 $a Society of Photo-optical Instrumentation Engineers. $3 700253
830 0 $a SPIE Press monograph ; $v PM103. $3 877204
830 0 $a SPIE Digital Library. $3 877386
856 4 0 $3 SPIE $u http://dx.doi.org/10.1117/3.975276