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反應式磁控濺鍍製備單層CrAlN及CrN/CrAlN/Al2O3多層堆疊...

楊書維

反應式磁控濺鍍製備單層CrAlN及CrN/CrAlN/Al2O3多層堆疊選擇性吸收薄膜之高溫性能研究 = = Studying High Temperature Characteristic of CrAlN and CrN/CrAlN/Al2O3 Selective Absorption Film On Stainless Steel Substrate By Using Reactive Magnetron Sputtering /

紀錄類型:	書目-語言資料,印刷品 : Monograph/item
正題名/作者:	反應式磁控濺鍍製備單層CrAlN及CrN/CrAlN/Al2O3多層堆疊選擇性吸收薄膜之高溫性能研究 =/ 楊書維撰.
其他題名:	Studying High Temperature Characteristic of CrAlN and CrN/CrAlN/Al2O3 Selective Absorption Film On Stainless Steel Substrate By Using Reactive Magnetron Sputtering /
其他題名:	Studying High Temperature Characteristic of CrAlN and CrN/CrAlN/Al2O3 Selective Absorption Film On Stainless Steel Substrate By Using Reactive Magnetron Sputtering.
作者:	楊書維
出版者:	雲林縣 :國立虎尾科技大學 , : 民104.07.,
面頁冊數:	[15], 94面 :圖, 表 ; : 30公分.;
附註:	指導教授：蔡定侃.
標題:	optical property. -
電子資源:	http://cetd.lib.nfu.edu.tw/etdservice/view_metadata?etdun=U0028-1108201516495300

反應式磁控濺鍍製備單層CrAlN及CrN/CrAlN/Al2O3多層堆疊選擇性吸收薄膜之高溫性能研究 = = Studying High Temperature Characteristic of CrAlN and CrN/CrAlN/Al2O3 Selective Absorption Film On Stainless Steel Substrate By Using Reactive Magnetron Sputtering /
楊書維

反應式磁控濺鍍製備單層CrAlN及CrN/CrAlN/Al2O3多層堆疊選擇性吸收薄膜之高溫性能研究 =Studying High Temperature Characteristic of CrAlN and CrN/CrAlN/Al2O3 Selective Absorption Film On Stainless Steel Substrate By Using Reactive Magnetron Sputtering /Studying High Temperature Characteristic of CrAlN and CrN/CrAlN/Al2O3 Selective Absorption Film On Stainless Steel Substrate By Using Reactive Magnetron Sputtering.楊書維撰. - 初版. - 雲林縣 :國立虎尾科技大學 ,民104.07. - [15], 94面 :圖, 表 ;30公分.

指導教授：蔡定侃.

含參考書目.Subjects--Topical Terms:

1015068
optical property.

反應式磁控濺鍍製備單層CrAlN及CrN/CrAlN/Al2O3多層堆疊選擇性吸收薄膜之高溫性能研究 = = Studying High Temperature Characteristic of CrAlN and CrN/CrAlN/Al2O3 Selective Absorption Film On Stainless Steel Substrate By Using Reactive Magnetron Sputtering /
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100 1 $a 楊書維 $q (Shu-Wei Yang) $3 1043769
245 1 0 $a 反應式磁控濺鍍製備單層CrAlN及CrN/CrAlN/Al2O3多層堆疊選擇性吸收薄膜之高溫性能研究 = $b Studying High Temperature Characteristic of CrAlN and CrN/CrAlN/Al2O3 Selective Absorption Film On Stainless Steel Substrate By Using Reactive Magnetron Sputtering / $c 楊書維撰.
246 3 1 $a Studying High Temperature Characteristic of CrAlN and CrN/CrAlN/Al2O3 Selective Absorption Film On Stainless Steel Substrate By Using Reactive Magnetron Sputtering.
250 $a 初版.
260 # $a 雲林縣 : $b 國立虎尾科技大學 , $c 民104.07.
300 $a [15], 94面 : $b 圖, 表 ; $c 30公分.
500 $a 指導教授：蔡定侃.
500 $a 碩士論文--國立虎尾科技大學材料科學與工程系材料科學與綠色能源工程碩士班.
504 $a 含參考書目.
650 # 4 $a optical property. $3 1015068
650 # 4 $a Thermal stability. $3 1150763
650 # 4 $a Spectrally selective absorber. $3 1015071
650 # 4 $a 光學性質. $3 1015072
650 # 4 $a 熱穩定. $3 1015073
650 # 4 $a CrN. $3 1015070
650 # 4 $a CrAlN. $3 1275588
650 # 4 $a 光譜選擇性吸收膜. $3 1015076
856 4 # $u http://cetd.lib.nfu.edu.tw/etdservice/view_metadata?etdun=U0028-1108201516495300