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Design for manufacturability with advanced lithography

Record Type:	Language materials, printed : Monograph/item
Title/Author:	Design for manufacturability with advanced lithography/ by Bei Yu, David Z. Pan.
Author:	Yu, Bei.
other author:	Pan, David Z.
Published:	Cham :Springer International Publishing : : 2016.,
Description:	xi, 164 p. :ill., digital ; : 24 cm.;
Contained By:	Springer eBooks
Subject:	Integrated circuits - Design and construction. -
Online resource:	http://dx.doi.org/10.1007/978-3-319-20385-0
ISBN:	9783319203850

Design for manufacturability with advanced lithography
Yu, Bei.

Design for manufacturability with advanced lithography[electronic resource] /by Bei Yu, David Z. Pan. - Cham :Springer International Publishing :2016. - xi, 164 p. :ill., digital ;24 cm.

Introduction -- Layout Decomposition for Triple Patterning -- Layout Decomposition for Other Patterning Techniques -- Standard Cell Compliance and Placement Co-Optimization -- Design for Manufacturability with E-Beam Lithography -- Conclusions and Future Works.

This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL) The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level, or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms. Enables readers to tackle the challenge of layout decompositions for different patterning techniques; Presents a coherent framework, including standard cell compliance and detailed placement, to enable Triple Patterning Lithography (TPL) friendly design; Includes coverage of the design for manufacturability with E-Beam lithography.

ISBN: 9783319203850

Standard No.: 10.1007/978-3-319-20385-0doiSubjects--Topical Terms:

561265
Integrated circuits
--Design and construction.

LC Class. No.: TK7874

Dewey Class. No.: 621.3815

Design for manufacturability with advanced lithography
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505 0 $a Introduction -- Layout Decomposition for Triple Patterning -- Layout Decomposition for Other Patterning Techniques -- Standard Cell Compliance and Placement Co-Optimization -- Design for Manufacturability with E-Beam Lithography -- Conclusions and Future Works.
520 $a This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL) The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level, or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms. Enables readers to tackle the challenge of layout decompositions for different patterning techniques; Presents a coherent framework, including standard cell compliance and detailed placement, to enable Triple Patterning Lithography (TPL) friendly design; Includes coverage of the design for manufacturability with E-Beam lithography.
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