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Helium Ion microscopy

紀錄類型:	書目-語言資料,印刷品 : Monograph/item
正題名/作者:	Helium Ion microscopy/ edited by Gregor Hlawacek, Armin Golzhauser.
其他作者:	Hlawacek, Gregor.
出版者:	Cham :Springer International Publishing : : 2016.,
面頁冊數:	xxiii, 526 p. :ill. (some col.), digital ; : 24 cm.;
Contained By:	Springer eBooks
標題:	Field ion microscopy. -
電子資源:	http://dx.doi.org/10.1007/978-3-319-41990-9
ISBN:	9783319419909

Helium Ion microscopy
Helium Ion microscopy[electronic resource] /edited by Gregor Hlawacek, Armin Golzhauser. - Cham :Springer International Publishing :2016. - xxiii, 526 p. :ill. (some col.), digital ;24 cm. - NanoScience and technology,1434-4904. - NanoScience and technology..

This book covers the fundamentals of Helium Ion Microscopy (HIM) including the Gas Field Ion Source (GFIS), column and contrast formation. It also provides first hand information on nanofabrication and high resolution imaging. Relevant theoretical models and the existing simulation approaches are discussed in an extra section. The structure of the book allows the novice to get acquainted with the specifics of the technique needed to understand the more applied chapters in the second half of the volume. The expert reader will find a complete reference of the technique covering all important applications in several chapters written by the leading experts in the field. This includes imaging of biological samples, resist and precursor based nanofabrication, applications in semiconductor industry, using Helium as well as Neon and many more. The fundamental part allows the regular HIM user to deepen his understanding of the method. A final chapter by Bill Ward, one of the pioneers of HIM, covering the historical developments leading to the existing tool complements the content.

ISBN: 9783319419909

Standard No.: 10.1007/978-3-319-41990-9doiSubjects--Topical Terms:

1078432
Field ion microscopy.

LC Class. No.: QH212.F5

Dewey Class. No.: 578.1

Helium Ion microscopy
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520 $a This book covers the fundamentals of Helium Ion Microscopy (HIM) including the Gas Field Ion Source (GFIS), column and contrast formation. It also provides first hand information on nanofabrication and high resolution imaging. Relevant theoretical models and the existing simulation approaches are discussed in an extra section. The structure of the book allows the novice to get acquainted with the specifics of the technique needed to understand the more applied chapters in the second half of the volume. The expert reader will find a complete reference of the technique covering all important applications in several chapters written by the leading experts in the field. This includes imaging of biological samples, resist and precursor based nanofabrication, applications in semiconductor industry, using Helium as well as Neon and many more. The fundamental part allows the regular HIM user to deepen his understanding of the method. A final chapter by Bill Ward, one of the pioneers of HIM, covering the historical developments leading to the existing tool complements the content.
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