語系:
繁體中文
English
說明(常見問題)
登入
回首頁
切換:
標籤
|
MARC模式
|
ISBD
Impact of ion implantation on quantu...
~
SpringerLink (Online service)
Impact of ion implantation on quantum dot heterostructures and devices
紀錄類型:
書目-語言資料,印刷品 : Monograph/item
正題名/作者:
Impact of ion implantation on quantum dot heterostructures and devices/ by Arjun Mandal, Subhananda Chakrabarti.
作者:
Mandal, Arjun.
其他作者:
Chakrabarti, Subhananda.
出版者:
Singapore :Springer Singapore : : 2017.,
面頁冊數:
xxiii, 64 p. :ill., digital ; : 24 cm.;
Contained By:
Springer eBooks
標題:
Quantum dots. -
電子資源:
http://dx.doi.org/10.1007/978-981-10-4334-5
ISBN:
9789811043345
Impact of ion implantation on quantum dot heterostructures and devices
Mandal, Arjun.
Impact of ion implantation on quantum dot heterostructures and devices
[electronic resource] /by Arjun Mandal, Subhananda Chakrabarti. - Singapore :Springer Singapore :2017. - xxiii, 64 p. :ill., digital ;24 cm.
This book looks at the effects of ion implantation as an effective post-growth technique to improve the material properties, and ultimately, the device performance of In(Ga)As/GaAs quantum dot (QD) heterostructures. Over the past two decades, In(Ga)As/GaAs-based QD heterostructures have marked their superiority, particularly for application in lasers and photodetectors. Several in-situ and ex-situ techniques that improve material quality and device performance have already been reported. These techniques are necessary to maintain dot density and dot size uniformity in QD heterostructures and also to improve the material quality of heterostructures by removing defects from the system. While rapid thermal annealing, pulsed laser annealing and the hydrogen passivation technique have been popular as post-growth methods, ion implantation had not been explored largely as a post-growth method for improving the material properties of In(Ga)As/GaAs QD heterostructures. This work attempts to remedy this gap in the literature. The work also looks at introduction of a capping layer of quaternary alloy InAlGaAs over these In(Ga)As/GaAs QDs to achieve better QD characteristics. The contents of this volume will prove useful to researchers and professionals involved in the study of QDs and QD-based devices.
ISBN: 9789811043345
Standard No.: 10.1007/978-981-10-4334-5doiSubjects--Topical Terms:
574252
Quantum dots.
LC Class. No.: QC611.6.Q35
Dewey Class. No.: 621.38152
Impact of ion implantation on quantum dot heterostructures and devices
LDR
:02325nam a2200313 a 4500
001
905568
003
DE-He213
005
20170602121611.0
006
m d
007
cr nn 008maaau
008
190308s2017 si s 0 eng d
020
$a
9789811043345
$q
(electronic bk.)
020
$a
9789811043338
$q
(paper)
024
7
$a
10.1007/978-981-10-4334-5
$2
doi
035
$a
978-981-10-4334-5
040
$a
GP
$c
GP
041
0
$a
eng
050
4
$a
QC611.6.Q35
072
7
$a
TJFD
$2
bicssc
072
7
$a
TEC021000
$2
bisacsh
072
7
$a
TEC008080
$2
bisacsh
082
0 4
$a
621.38152
$2
23
090
$a
QC611.6.Q35
$b
M271 2017
100
1
$a
Mandal, Arjun.
$3
1172800
245
1 0
$a
Impact of ion implantation on quantum dot heterostructures and devices
$h
[electronic resource] /
$c
by Arjun Mandal, Subhananda Chakrabarti.
260
$a
Singapore :
$c
2017.
$b
Springer Singapore :
$b
Imprint: Springer,
300
$a
xxiii, 64 p. :
$b
ill., digital ;
$c
24 cm.
520
$a
This book looks at the effects of ion implantation as an effective post-growth technique to improve the material properties, and ultimately, the device performance of In(Ga)As/GaAs quantum dot (QD) heterostructures. Over the past two decades, In(Ga)As/GaAs-based QD heterostructures have marked their superiority, particularly for application in lasers and photodetectors. Several in-situ and ex-situ techniques that improve material quality and device performance have already been reported. These techniques are necessary to maintain dot density and dot size uniformity in QD heterostructures and also to improve the material quality of heterostructures by removing defects from the system. While rapid thermal annealing, pulsed laser annealing and the hydrogen passivation technique have been popular as post-growth methods, ion implantation had not been explored largely as a post-growth method for improving the material properties of In(Ga)As/GaAs QD heterostructures. This work attempts to remedy this gap in the literature. The work also looks at introduction of a capping layer of quaternary alloy InAlGaAs over these In(Ga)As/GaAs QDs to achieve better QD characteristics. The contents of this volume will prove useful to researchers and professionals involved in the study of QDs and QD-based devices.
650
0
$a
Quantum dots.
$3
574252
650
1 4
$a
Materials Science.
$3
671087
650
2 4
$a
Optical and Electronic Materials.
$3
593919
650
2 4
$a
Circuits and Systems.
$3
670901
650
2 4
$a
Electronic Circuits and Devices.
$3
782968
650
2 4
$a
Optics, Lasers, Photonics, Optical Devices.
$3
1112289
650
2 4
$a
Signal, Image and Speech Processing.
$3
670837
700
1
$a
Chakrabarti, Subhananda.
$3
1142267
710
2
$a
SpringerLink (Online service)
$3
593884
773
0
$t
Springer eBooks
856
4 0
$u
http://dx.doi.org/10.1007/978-981-10-4334-5
950
$a
Chemistry and Materials Science (Springer-11644)
筆 0 讀者評論
多媒體
評論
新增評論
分享你的心得
Export
取書館別
處理中
...
變更密碼[密碼必須為2種組合(英文和數字)及長度為10碼以上]
登入