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Physical design and mask synthesis f...

Shin, Youngsoo.

Physical design and mask synthesis for directed self-assembly lithography

紀錄類型:	書目-語言資料,印刷品 : Monograph/item
正題名/作者:	Physical design and mask synthesis for directed self-assembly lithography/ by Seongbo Shim, Youngsoo Shin.
作者:	Shim, Seongbo.
其他作者:	Shin, Youngsoo.
出版者:	Cham :Springer International Publishing : : 2018.,
面頁冊數:	xiv, 138 p. :ill. (some col.), digital ; : 24 cm.;
Contained By:	Springer eBooks
標題:	Integrated circuits - Design and construction. -
電子資源:	http://dx.doi.org/10.1007/978-3-319-76294-4
ISBN:	9783319762944

Physical design and mask synthesis for directed self-assembly lithography
Shim, Seongbo.

Physical design and mask synthesis for directed self-assembly lithography[electronic resource] /by Seongbo Shim, Youngsoo Shin. - Cham :Springer International Publishing :2018. - xiv, 138 p. :ill. (some col.), digital ;24 cm. - NanoScience and technology,1434-4904. - NanoScience and technology..

Introduction -- DSAL Manufacturability -- Placement Optimization for DSAL -- Placement Optimization for MP-DSAL Compliant Layout -- Redundant Via Insertion for DSAL.

This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology.

ISBN: 9783319762944

Standard No.: 10.1007/978-3-319-76294-4doiSubjects--Topical Terms:

561265
Integrated circuits
--Design and construction.

LC Class. No.: TK7874 / .S556 2018

Dewey Class. No.: 621.3815

Physical design and mask synthesis for directed self-assembly lithography
LDR:01639nam a2200337 a 4500 001 924660
003 DE-He213
005 20180914145041.0
006 m d
007 cr nn 008maaau
008 190625s2018 gw s 0 eng d
020 $a 9783319762944 $q (electronic bk.)
020 $a 9783319762937 $q (paper)
024 7 $a 10.1007/978-3-319-76294-4 $2 doi
035 $a 978-3-319-76294-4
040 $a GP $c GP
041 0 $a eng
050 4 $a TK7874 $b .S556 2018
072 7 $a TBN $2 bicssc
072 7 $a TEC027000 $2 bisacsh
072 7 $a SCI050000 $2 bisacsh
082 0 4 $a 621.3815 $2 23
090 $a TK7874 $b .S556 2018
100 1 $a Shim, Seongbo. $3 1201831
245 1 0 $a Physical design and mask synthesis for directed self-assembly lithography $h [electronic resource] / $c by Seongbo Shim, Youngsoo Shin.
260 $a Cham : $c 2018. $b Springer International Publishing : $b Imprint: Springer,
300 $a xiv, 138 p. : $b ill. (some col.), digital ; $c 24 cm.
490 1 $a NanoScience and technology, $x 1434-4904
505 0 $a Introduction -- DSAL Manufacturability -- Placement Optimization for DSAL -- Placement Optimization for MP-DSAL Compliant Layout -- Redundant Via Insertion for DSAL.
520 $a This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology.
650 0 $a Integrated circuits $x Design and construction. $3 561265
650 0 $a Integrated circuits $x Masks. $3 564464
650 0 $a Self-assembly (Chemistry) $3 655661
650 0 $a Lithography. $3 877347
650 1 4 $a Materials Science. $3 671087
650 2 4 $a Nanotechnology. $3 557660
650 2 4 $a Nanotechnology and Microengineering. $3 722030
650 2 4 $a Circuits and Systems. $3 670901
650 2 4 $a Optical and Electronic Materials. $3 593919
650 2 4 $a Nanoscale Science and Technology. $3 783795
650 2 4 $a Semiconductors. $3 578843
700 1 $a Shin, Youngsoo. $3 1113480
710 2 $a SpringerLink (Online service) $3 593884
773 0 $t Springer eBooks
830 0 $a NanoScience and technology. $3 881464
856 4 0 $u http://dx.doi.org/10.1007/978-3-319-76294-4
950 $a Chemistry and Materials Science (Springer-11644)

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