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Physical design and mask synthesis f...
~
Shin, Youngsoo.
Physical design and mask synthesis for directed self-assembly lithography
Record Type:
Language materials, printed : Monograph/item
Title/Author:
Physical design and mask synthesis for directed self-assembly lithography/ by Seongbo Shim, Youngsoo Shin.
Author:
Shim, Seongbo.
other author:
Shin, Youngsoo.
Published:
Cham :Springer International Publishing : : 2018.,
Description:
xiv, 138 p. :ill. (some col.), digital ; : 24 cm.;
Contained By:
Springer eBooks
Subject:
Integrated circuits - Design and construction. -
Online resource:
http://dx.doi.org/10.1007/978-3-319-76294-4
ISBN:
9783319762944
Physical design and mask synthesis for directed self-assembly lithography
Shim, Seongbo.
Physical design and mask synthesis for directed self-assembly lithography
[electronic resource] /by Seongbo Shim, Youngsoo Shin. - Cham :Springer International Publishing :2018. - xiv, 138 p. :ill. (some col.), digital ;24 cm. - NanoScience and technology,1434-4904. - NanoScience and technology..
Introduction -- DSAL Manufacturability -- Placement Optimization for DSAL -- Placement Optimization for MP-DSAL Compliant Layout -- Redundant Via Insertion for DSAL.
This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology.
ISBN: 9783319762944
Standard No.: 10.1007/978-3-319-76294-4doiSubjects--Topical Terms:
561265
Integrated circuits
--Design and construction.
LC Class. No.: TK7874 / .S556 2018
Dewey Class. No.: 621.3815
Physical design and mask synthesis for directed self-assembly lithography
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by Seongbo Shim, Youngsoo Shin.
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ill. (some col.), digital ;
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24 cm.
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Introduction -- DSAL Manufacturability -- Placement Optimization for DSAL -- Placement Optimization for MP-DSAL Compliant Layout -- Redundant Via Insertion for DSAL.
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This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology.
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Integrated circuits
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Design and construction.
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561265
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Integrated circuits
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Masks.
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Self-assembly (Chemistry)
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Lithography.
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Materials Science.
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Nanotechnology.
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Nanotechnology and Microengineering.
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Circuits and Systems.
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Optical and Electronic Materials.
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Nanoscale Science and Technology.
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Shin, Youngsoo.
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http://dx.doi.org/10.1007/978-3-319-76294-4
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Chemistry and Materials Science (Springer-11644)
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