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Temperature Measurement during Millisecond Annealing = Ripple Pyrometry for Flash Lamp Annealers /

紀錄類型:	書目-語言資料,印刷品 : Monograph/item
正題名/作者:	Temperature Measurement during Millisecond Annealing/ by Denise Reichel.
其他題名:	Ripple Pyrometry for Flash Lamp Annealers /
作者:	Reichel, Denise.
面頁冊數:	XXV, 112 p. 77 illus. in color.online resource. :
Contained By:	Springer Nature eBook
標題:	Solid state physics. -
電子資源:	https://doi.org/10.1007/978-3-658-11388-9
ISBN:	9783658113889

Temperature Measurement during Millisecond Annealing = Ripple Pyrometry for Flash Lamp Annealers /
Reichel, Denise.

Temperature Measurement during Millisecond AnnealingRipple Pyrometry for Flash Lamp Annealers /[electronic resource] :by Denise Reichel. - 1st ed. 2015. - XXV, 112 p. 77 illus. in color.online resource. - MatWerk,2522-0756. - MatWerk,.

Introduction and motivation.- Fundamentals of flash lamp annealing of shallow Boron-doped Silicon.- Fundamentals of surface temperature measurements during flash lamp annealing -- Concept of ripple pyrometry during flash lamp annealing -- Ripple pyrometry for flash lamp annealing.- Experiments – ripple pyrometry during flash lamp annealing.- Closing discussion and outlook.

Denise Reichel studies the delicate subject of temperature measurement during lamp-based annealing of semiconductors, in particular during flash lamp annealing. The approach of background-correction using amplitude-modulated light to obtain the sample reflectivity is reinvented from rapid thermal annealing to apply to millisecond annealing. The author presents a new method independent of the lamp operation to obtain this amplitude modulation and derives a formula to describe the process. Further, she investigates the variables of the formula in depth to validate the method’s suitability for background-corrected temperature measurement. The experimental results finally proof its power for elevated temperatures. Contents Fundamentals of flash lamp annealing of shallow Boron-doped Silicon Fundamentals of surface temperature measurements during flash lamp annealing Concept of ripple pyrometry during flash lamp annealing Ripple pyrometry for flash lamp annealing – Experiments Target Groups ·Researchers and students from the fields of materials sciences and physics ·Practitioners from microelectronics and photovoltaics industry About the Author Dr. Denise Reichel currently works in technical sales and consulting for temperature measurement needs and as a lecturer for thermodynamics and heat and mass transfer. .

ISBN: 9783658113889

Standard No.: 10.1007/978-3-658-11388-9doiSubjects--Topical Terms:

641431
Solid state physics.

LC Class. No.: QC176-176.9

Dewey Class. No.: 530.41

Temperature Measurement during Millisecond Annealing = Ripple Pyrometry for Flash Lamp Annealers /
LDR:03074nam a22003855i 4500 001 961908
003 DE-He213
005 20200705035149.0
007 cr nn 008mamaa
008 201211s2015 gw | s |||| 0|eng d
020 $a 9783658113889 $9 978-3-658-11388-9
024 7 $a 10.1007/978-3-658-11388-9 $2 doi
035 $a 978-3-658-11388-9
050 4 $a QC176-176.9
072 7 $a PNFS $2 bicssc
072 7 $a SCI077000 $2 bisacsh
072 7 $a PNFS $2 thema
082 0 4 $a 530.41 $2 23
100 1 $a Reichel, Denise. $4 aut $4 http://id.loc.gov/vocabulary/relators/aut $3 1070605
245 1 0 $a Temperature Measurement during Millisecond Annealing $h [electronic resource] : $b Ripple Pyrometry for Flash Lamp Annealers / $c by Denise Reichel.
250 $a 1st ed. 2015.
264 1 $a Wiesbaden : $b Springer Fachmedien Wiesbaden : $b Imprint: Springer, $c 2015.
300 $a XXV, 112 p. 77 illus. in color. $b online resource.
336 $a text $b txt $2 rdacontent
337 $a computer $b c $2 rdamedia
338 $a online resource $b cr $2 rdacarrier
347 $a text file $b PDF $2 rda
490 1 $a MatWerk, $x 2522-0756
505 0 $a Introduction and motivation.- Fundamentals of flash lamp annealing of shallow Boron-doped Silicon.- Fundamentals of surface temperature measurements during flash lamp annealing -- Concept of ripple pyrometry during flash lamp annealing -- Ripple pyrometry for flash lamp annealing.- Experiments – ripple pyrometry during flash lamp annealing.- Closing discussion and outlook.
520 $a Denise Reichel studies the delicate subject of temperature measurement during lamp-based annealing of semiconductors, in particular during flash lamp annealing. The approach of background-correction using amplitude-modulated light to obtain the sample reflectivity is reinvented from rapid thermal annealing to apply to millisecond annealing. The author presents a new method independent of the lamp operation to obtain this amplitude modulation and derives a formula to describe the process. Further, she investigates the variables of the formula in depth to validate the method’s suitability for background-corrected temperature measurement. The experimental results finally proof its power for elevated temperatures. Contents Fundamentals of flash lamp annealing of shallow Boron-doped Silicon Fundamentals of surface temperature measurements during flash lamp annealing Concept of ripple pyrometry during flash lamp annealing Ripple pyrometry for flash lamp annealing – Experiments Target Groups ·Researchers and students from the fields of materials sciences and physics ·Practitioners from microelectronics and photovoltaics industry About the Author Dr. Denise Reichel currently works in technical sales and consulting for temperature measurement needs and as a lecturer for thermodynamics and heat and mass transfer. .
650 0 $a Solid state physics. $3 641431
650 0 $a Thermodynamics. $3 596513
650 0 $a Engineering—Materials. $3 1253659
650 1 4 $a Solid State Physics. $3 768851
650 2 4 $a Materials Engineering. $3 1062318
710 2 $a SpringerLink (Online service) $3 593884
773 0 $t Springer Nature eBook
776 0 8 $i Printed edition: $z 9783658113872
830 0 $a MatWerk, $x 2522-0756 $3 1256704
856 4 0 $u https://doi.org/10.1007/978-3-658-11388-9
912 $a ZDB-2-SBL
912 $a ZDB-2-SXB
950 $a Biomedical and Life Sciences (SpringerNature-11642)
950 $a Biomedical and Life Sciences (R0) (SpringerNature-43708)