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Design for Manufacturability with Advanced Lithography

紀錄類型:	書目-語言資料,印刷品 : Monograph/item
正題名/作者:	Design for Manufacturability with Advanced Lithography/ by Bei Yu, David Z. Pan.
作者:	Yu, Bei.
其他作者:	Pan, David Z.
面頁冊數:	XI, 164 p. 100 illus., 91 illus. in color.online resource. :
Contained By:	Springer Nature eBook
標題:	Electronic circuits. -
電子資源:	https://doi.org/10.1007/978-3-319-20385-0
ISBN:	9783319203850

Design for Manufacturability with Advanced Lithography
Yu, Bei.

Design for Manufacturability with Advanced Lithography[electronic resource] /by Bei Yu, David Z. Pan. - 1st ed. 2016. - XI, 164 p. 100 illus., 91 illus. in color.online resource.

Introduction -- Layout Decomposition for Triple Patterning -- Layout Decomposition for Other Patterning Techniques -- Standard Cell Compliance and Placement Co-Optimization -- Design for Manufacturability with E-Beam Lithography -- Conclusions and Future Works.-.

This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level, or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms. Enables readers to tackle the challenge of layout decompositions for different patterning techniques; Presents a coherent framework, including standard cell compliance and detailed placement, to enable Triple Patterning Lithography (TPL) friendly design; Includes coverage of the design for manufacturability with E-Beam lithography.

ISBN: 9783319203850

Standard No.: 10.1007/978-3-319-20385-0doiSubjects--Topical Terms:

563332
Electronic circuits.

LC Class. No.: TK7888.4

Dewey Class. No.: 621.3815

Design for Manufacturability with Advanced Lithography
LDR:02537nam a22003975i 4500 001 981670
003 DE-He213
005 20200706104957.0
007 cr nn 008mamaa
008 201211s2016 gw | s |||| 0|eng d
020 $a 9783319203850 $9 978-3-319-20385-0
024 7 $a 10.1007/978-3-319-20385-0 $2 doi
035 $a 978-3-319-20385-0
050 4 $a TK7888.4
072 7 $a TJFC $2 bicssc
072 7 $a TEC008010 $2 bisacsh
072 7 $a TJFC $2 thema
082 0 4 $a 621.3815 $2 23
100 1 $a Yu, Bei. $4 aut $4 http://id.loc.gov/vocabulary/relators/aut $3 1102643
245 1 0 $a Design for Manufacturability with Advanced Lithography $h [electronic resource] / $c by Bei Yu, David Z. Pan.
250 $a 1st ed. 2016.
264 1 $a Cham : $b Springer International Publishing : $b Imprint: Springer, $c 2016.
300 $a XI, 164 p. 100 illus., 91 illus. in color. $b online resource.
336 $a text $b txt $2 rdacontent
337 $a computer $b c $2 rdamedia
338 $a online resource $b cr $2 rdacarrier
347 $a text file $b PDF $2 rda
505 0 $a Introduction -- Layout Decomposition for Triple Patterning -- Layout Decomposition for Other Patterning Techniques -- Standard Cell Compliance and Placement Co-Optimization -- Design for Manufacturability with E-Beam Lithography -- Conclusions and Future Works.-.
520 $a This book introduces readers to the most advanced research results on Design for Manufacturability (DFM) with multiple patterning lithography (MPL) and electron beam lithography (EBL). The authors describe in detail a set of algorithms/methodologies to resolve issues in modern design for manufacturability problems with advanced lithography. Unlike books that discuss DFM from the product level, or physical manufacturing level, this book describes DFM solutions from a circuit design level, such that most of the critical problems can be formulated and solved through combinatorial algorithms. Enables readers to tackle the challenge of layout decompositions for different patterning techniques; Presents a coherent framework, including standard cell compliance and detailed placement, to enable Triple Patterning Lithography (TPL) friendly design; Includes coverage of the design for manufacturability with E-Beam lithography.
650 0 $a Electronic circuits. $3 563332
650 0 $a Microprocessors. $3 632481
650 0 $a Electronics. $3 596389
650 0 $a Microelectronics. $3 554956
650 1 4 $a Circuits and Systems. $3 670901
650 2 4 $a Processor Architectures. $3 669787
650 2 4 $a Electronics and Microelectronics, Instrumentation. $3 670219
700 1 $a Pan, David Z. $4 aut $4 http://id.loc.gov/vocabulary/relators/aut $3 1102644
710 2 $a SpringerLink (Online service) $3 593884
773 0 $t Springer Nature eBook
776 0 8 $i Printed edition: $z 9783319203843
776 0 8 $i Printed edition: $z 9783319203867
776 0 8 $i Printed edition: $z 9783319373935
856 4 0 $u https://doi.org/10.1007/978-3-319-20385-0
912 $a ZDB-2-ENG
912 $a ZDB-2-SXE
950 $a Engineering (SpringerNature-11647)
950 $a Engineering (R0) (SpringerNature-43712)