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Progress in Pattern Recognition, Ima...
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Mendoza, Marcelo.
Progress in Pattern Recognition, Image Analysis, Computer Vision, and Applications = 22nd Iberoamerican Congress, CIARP 2017, Valparaíso, Chile, November 7–10, 2017, Proceedings /
紀錄類型:
書目-語言資料,印刷品 : Monograph/item
正題名/作者:
Progress in Pattern Recognition, Image Analysis, Computer Vision, and Applications/ edited by Marcelo Mendoza, Sergio Velastín.
其他題名:
22nd Iberoamerican Congress, CIARP 2017, Valparaíso, Chile, November 7–10, 2017, Proceedings /
其他作者:
Mendoza, Marcelo.
面頁冊數:
XVIII, 730 p. 249 illus.online resource. :
Contained By:
Springer Nature eBook
標題:
Pattern recognition. -
電子資源:
https://doi.org/10.1007/978-3-319-75193-1
ISBN:
9783319751931
Progress in Pattern Recognition, Image Analysis, Computer Vision, and Applications = 22nd Iberoamerican Congress, CIARP 2017, Valparaíso, Chile, November 7–10, 2017, Proceedings /
Progress in Pattern Recognition, Image Analysis, Computer Vision, and Applications
22nd Iberoamerican Congress, CIARP 2017, Valparaíso, Chile, November 7–10, 2017, Proceedings /[electronic resource] :edited by Marcelo Mendoza, Sergio Velastín. - 1st ed. 2018. - XVIII, 730 p. 249 illus.online resource. - Image Processing, Computer Vision, Pattern Recognition, and Graphics ;10657. - Image Processing, Computer Vision, Pattern Recognition, and Graphics ;9219.
This book constitutes the refereed post-conference proceedings of the 22nd Iberoamerican Congress on Pattern Recognition, CIARP 2017, held in Valparaíso, Chile, in November 2017. The 87 papers presented were carefully reviewed and selected from 156 submissions. The papers feature research results in the areas of pattern recognition, image processing, computer vision, multimedia and related fields. .
ISBN: 9783319751931
Standard No.: 10.1007/978-3-319-75193-1doiSubjects--Topical Terms:
1253525
Pattern recognition.
LC Class. No.: Q337.5
Dewey Class. No.: 006.4
Progress in Pattern Recognition, Image Analysis, Computer Vision, and Applications = 22nd Iberoamerican Congress, CIARP 2017, Valparaíso, Chile, November 7–10, 2017, Proceedings /
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