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Physical Design and Mask Synthesis for Directed Self-Assembly Lithography

紀錄類型:	書目-語言資料,印刷品 : Monograph/item
正題名/作者:	Physical Design and Mask Synthesis for Directed Self-Assembly Lithography/ by Seongbo Shim, Youngsoo Shin.
作者:	Shim, Seongbo.
其他作者:	Shin, Youngsoo.
面頁冊數:	XIV, 138 p. 92 illus., 54 illus. in color.online resource. :
Contained By:	Springer Nature eBook
標題:	Nanotechnology. -
電子資源:	https://doi.org/10.1007/978-3-319-76294-4
ISBN:	9783319762944

Physical Design and Mask Synthesis for Directed Self-Assembly Lithography
Shim, Seongbo.

Physical Design and Mask Synthesis for Directed Self-Assembly Lithography[electronic resource] /by Seongbo Shim, Youngsoo Shin. - 1st ed. 2018. - XIV, 138 p. 92 illus., 54 illus. in color.online resource. - NanoScience and Technology,1434-4904. - NanoScience and Technology,.

Introduction -- DSAL Manufacturability -- Placement Optimization for DSAL -- Placement Optimization for MP-DSAL Compliant Layout -- Redundant Via Insertion for DSAL.

This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology.

ISBN: 9783319762944

Standard No.: 10.1007/978-3-319-76294-4doiSubjects--Topical Terms:

557660
Nanotechnology.

LC Class. No.: T174.7

Dewey Class. No.: 620.115

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