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Physical Design and Mask Synthesis for Directed Self-Assembly Lithography

Record Type:	Language materials, printed : Monograph/item
Title/Author:	Physical Design and Mask Synthesis for Directed Self-Assembly Lithography/ by Seongbo Shim, Youngsoo Shin.
Author:	Shim, Seongbo.
other author:	Shin, Youngsoo.
Description:	XIV, 138 p. 92 illus., 54 illus. in color.online resource. :
Contained By:	Springer Nature eBook
Subject:	Nanotechnology. -
Online resource:	https://doi.org/10.1007/978-3-319-76294-4
ISBN:	9783319762944

Physical Design and Mask Synthesis for Directed Self-Assembly Lithography
Shim, Seongbo.

Physical Design and Mask Synthesis for Directed Self-Assembly Lithography[electronic resource] /by Seongbo Shim, Youngsoo Shin. - 1st ed. 2018. - XIV, 138 p. 92 illus., 54 illus. in color.online resource. - NanoScience and Technology,1434-4904. - NanoScience and Technology,.

Introduction -- DSAL Manufacturability -- Placement Optimization for DSAL -- Placement Optimization for MP-DSAL Compliant Layout -- Redundant Via Insertion for DSAL.

This book discusses physical design and mask synthesis of directed self-assembly lithography (DSAL). It covers the basic background of DSAL technology, physical design optimizations such as placement and redundant via insertion, and DSAL mask synthesis as well as its verification. Directed self-assembly lithography (DSAL) is a highly promising patterning solution in sub-7nm technology.

ISBN: 9783319762944

Standard No.: 10.1007/978-3-319-76294-4doiSubjects--Topical Terms:

557660
Nanotechnology.

LC Class. No.: T174.7

Dewey Class. No.: 620.115

Physical Design and Mask Synthesis for Directed Self-Assembly Lithography
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