共濺鍍與電化學共沉積Co-Ru合金薄膜之特性 = = Character...
方少彤

 

  • 共濺鍍與電化學共沉積Co-Ru合金薄膜之特性 = = Characteristics of Co-Ru Alloy Thin Films Prepared by Co-sputtering and Electrochemical Co-deposition /
  • Record Type: Language materials, printed : Monograph/item
    Title/Author: 共濺鍍與電化學共沉積Co-Ru合金薄膜之特性 =/ 方少彤.
    Reminder of title: Characteristics of Co-Ru Alloy Thin Films Prepared by Co-sputtering and Electrochemical Co-deposition /
    remainder title: Characteristics of Co-Ru Alloy Thin Films Prepared by Co-sputtering and Electrochemical Co-deposition.
    Author: 方少彤
    Published: 雲林縣 :國立虎尾科技大學 , : 民112.07.,
    Description: [19], 141面 :圖, 表 ; : 30公分.;
    Notes: 指導教授: 方昭訓.
    Subject: interconnects. -
    Online resource: 電子資源
Items
  • 1 records • Pages 1 •
 
T012587 圖書館B1F 博碩士論文專區 不流通(NON_CIR) 碩士論文(TM) TM 008.152M 0097 112 一般使用(Normal) On shelf 0
  • 1 records • Pages 1 •
Multimedia
Reviews
Export
pickup library
 
 
Change password
Login