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Advances in CMP/polishing technologi...

Kurokawa, Syuhei.

Advances in CMP/polishing technologies for the manufacture of electronic devices

Record Type:	Language materials, printed : Monograph/item
Title/Author:	Advances in CMP/polishing technologies for the manufacture of electronic devices/ edited by Toshiro Doi, Ioan D. Marinescu, Syuhei Kurokawa.
other author:	Doi, Toshiro.
Published:	Oxford :William Andrew, : 2012.,
Description:	1 online resource (xii, 317 p.)
Notes:	Includes index.
Subject:	Electrolytic polishing. -
Online resource:	http://www.sciencedirect.com/science/book/9781437778595
ISBN:	9781437778595

Advances in CMP/polishing technologies for the manufacture of electronic devices
Advances in CMP/polishing technologies for the manufacture of electronic devices[electronic resource] /edited by Toshiro Doi, Ioan D. Marinescu, Syuhei Kurokawa. - 1st ed. - Oxford :William Andrew,2012. - 1 online resource (xii, 317 p.)

Includes index.

ISBN: 9781437778595Subjects--Topical Terms:

874130
Electrolytic polishing.

LC Class. No.: TS670 / .A386 2012eb

Dewey Class. No.: 671.7/2

Advances in CMP/polishing technologies for the manufacture of electronic devices
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020 $a 1437778593
035 $a ocn769153733
050 4 $a TS670 $b .A386 2012eb
082 0 4 $a 671.7/2 $2 23
245 0 0 $a Advances in CMP/polishing technologies for the manufacture of electronic devices $h [electronic resource] / $c edited by Toshiro Doi, Ioan D. Marinescu, Syuhei Kurokawa.
250 $a 1st ed.
260 $a Oxford : $b William Andrew, $c 2012.
300 $a 1 online resource (xii, 317 p.)
500 $a Includes index.
650 0 $a Electrolytic polishing. $3 874130
650 0 $a Grinding and polishing. $3 712634
700 1 $a Doi, Toshiro. $3 874128
700 1 $a Marinescu, Ioan D. $3 712635
700 1 $a Kurokawa, Syuhei. $3 874129
856 4 0 $3 ScienceDirect $u http://www.sciencedirect.com/science/book/9781437778595

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