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Chemistry and lithography

Record Type:	Language materials, printed : Monograph/item
Title/Author:	Chemistry and lithography/ Uzodinma Okoroanyanwu.
Author:	Okoroanyanwu, Uzodinma.
Published:	Bellingham, Wash. (1000 20th St. Bellingham WA 98225-6705 USA) :SPIE, : 2010.,
Description:	1 online resource (xxv, 861 p.) :ill. :
Notes:	"SPIE digital library."
Subject:	Lithography. -
Online resource:	http://dx.doi.org/10.1117/3.821384
ISBN:	9780819483997 (electronic)

Chemistry and lithography
Okoroanyanwu, Uzodinma.

Chemistry and lithography[electronic resource] /Uzodinma Okoroanyanwu. - Bellingham, Wash. (1000 20th St. Bellingham WA 98225-6705 USA) :SPIE,2010. - 1 online resource (xxv, 861 p.) :ill. - Press monograph ;192. - SPIE Press monograph ;PM103..

"SPIE digital library."

Part I: Origins, inventions, and the evolution of lithography. 1. Introduction to lithography -- 2. Invention of lithography and photolithography -- 3. Optical and chemical origins of lithography -- 4. Evolution of lithography.

Restricted to subscribers or individual electronic text purchasers.

This book provides a comprehensive treatment of the chemical phenomena in lithography in a manner that is accessible to a general readership. The book presents topics on the optical and charged particle physics practiced in lithography, with a broader view of how the marriage between chemistry and optics has made possible the print and electronic revolutions of the digital age. The related aspects of lithography are thematically presented to convey a unified view of the developments in the field over time, from the very first recorded reflections on the nature of matter to the latest developments at the frontiers of lithography science and technology.

Mode of access: World Wide Web.

ISBN: 9780819483997 (electronic)

Standard No.: 10.1117/3.821384doiSubjects--Topical Terms:

877347
Lithography.
Index Terms--Genre/Form:

554714
Electronic books.

LC Class. No.: NE2425 / .O38 2010eb

Dewey Class. No.: 621.3815/31

Chemistry and lithography
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020 $z 0819475629 (print)
020 $z 9780819475626 (print)
024 7 $a 10.1117/3.821384 $2 doi
035 $a (OCoLC)693785973
035 $a (CaBNVSL)gtp00544229
035 $a 9780819483997
040 $a CaBNVSL $c CaBNVSL $d CaBNVSL
050 4 $a NE2425 $b .O38 2010eb
082 0 4 $a 621.3815/31 $2 22
100 1 $a Okoroanyanwu, Uzodinma. $3 877390
245 1 0 $a Chemistry and lithography $h [electronic resource] / $c Uzodinma Okoroanyanwu.
260 $a Bellingham, Wash. (1000 20th St. Bellingham WA 98225-6705 USA) : $b SPIE, $c 2010.
300 $a 1 online resource (xxv, 861 p.) : $b ill.
490 1 $a Press monograph ; $v 192
500 $a "SPIE digital library."
505 0 $a Part I: Origins, inventions, and the evolution of lithography. 1. Introduction to lithography -- 2. Invention of lithography and photolithography -- 3. Optical and chemical origins of lithography -- 4. Evolution of lithography.
505 0 $a Part II: Lithographic chemicals. 5. Lithographic chemicals -- 6. Negative resists -- 7. Positive resists -- 8. General considerations on the radiation and photochemistry of resists -- 9. Antireflection coatings and reflectivity control.
505 0 $a Part III: The practice of lithography. 10. Stone, plate, and offset lithography -- 11. The semiconductor lithographic process -- 12. Lithographic modeling -- 13. Optical lithography -- 14. X-ray and extreme-ultraviolet lithographies -- 15. Charged particle lithography -- 16. Lithography in integrated circuit device fabrication -- 17. Advanced resist processing and resist resolution limit issues -- Afterword.
506 $a Restricted to subscribers or individual electronic text purchasers.
520 $a This book provides a comprehensive treatment of the chemical phenomena in lithography in a manner that is accessible to a general readership. The book presents topics on the optical and charged particle physics practiced in lithography, with a broader view of how the marriage between chemistry and optics has made possible the print and electronic revolutions of the digital age. The related aspects of lithography are thematically presented to convey a unified view of the developments in the field over time, from the very first recorded reflections on the nature of matter to the latest developments at the frontiers of lithography science and technology.
530 $a Also available in print version.
538 $a Mode of access: World Wide Web.
538 $a System requirements: Adobe Acrobat Reader.
588 $a Title from PDF title page (SPIE eBooks Web site, viewed Oct. 22, 2010).
650 0 $a Lithography. $3 877347
650 0 $a Chemistry, Technical. $3 591520
655 0 $a Electronic books. $2 local $3 554714
710 2 $a Society of Photo-optical Instrumentation Engineers. $3 700253
830 0 $a SPIE Press monograph ; $v PM103. $3 877204
830 0 $a SPIE Digital Library. $3 877386
856 4 0 $3 SPIE $u http://dx.doi.org/10.1117/3.821384