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Principles of lithography

Record Type:	Language materials, printed : Monograph/item
Title/Author:	Principles of lithography/ Harry J. Levinson.
Author:	Levinson, Harry J.
Published:	Bellingham, Wash. (1000 20th St. Bellingham WA 98225-6705 USA) :SPIE, : 2010.,
Description:	1 online resource (xiii, 494 p.) :ill. :
Notes:	"SPIE digital library"--Website.
Subject:	Integrated circuits - Design and construction. -
Online resource:	http://dx.doi.org/10.1117/3.865363
ISBN:	9780819483256 (electronic)

Principles of lithography
Levinson, Harry J.

Principles of lithography[electronic resource] /Harry J. Levinson. - 3rd ed. - Bellingham, Wash. (1000 20th St. Bellingham WA 98225-6705 USA) :SPIE,2010. - 1 online resource (xiii, 494 p.) :ill. - Press monograph ;198. - SPIE Press monograph ;PM103..

"SPIE digital library"--Website.

Includes bibliographical references.

Preface to the third edition -- Preface to the second edition -- Preface -- Chapter 1. Overview of lithography -- Chapter 2. Optical pattern formation -- Chapter 3. Photoresists -- Chapter 4. Modeling and thin-film effects -- Chapter 5. Wafer steppers -- Chapter 6. Overlay -- Chapter 7. Masks and reticles -- Chapter 8. Confronting the diffraction limit -- Chapter 9. Metrology -- Chapter 10. Immersion lithography and the limits of optical lithography -- Chapter 11. Lithography costs -- Chapter 12. Extreme ultraviolet lithography -- Chapter 13. Alternative lithography techniques -- Appendix A: Coherence.

Restricted to subscribers or individual electronic text purchasers.

The publication of Principles of Lithography, Third Edition just five years after the previous edition is evidence of the quickly changing and exciting nature of lithography as applied to the production of integrated circuits and other micro- and nanoscale devices. This text is intended to serve as an introduction to the science of microlithography, but also covers several subjects in depth, making it useful to the experienced lithographer as well. Topics directly related to manufacturing tools are addressed, including overlay, the stages of exposure, tools, and light sources. This updated edition reflects recent advances in technology, including the shift of immersion lithography from development into volume manufacturing, and the movement of EUV lithography from the lab to development pilot lines. New references and homework problems are included. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus.

Mode of access: World Wide Web.

ISBN: 9780819483256 (electronic)

Standard No.: 10.1117/3.865363doiSubjects--Topical Terms:

561265
Integrated circuits
--Design and construction.Index Terms--Genre/Form:

554714
Electronic books.

LC Class. No.: TK7874 / .L397 2010eb

Dewey Class. No.: 621.3815/31

Principles of lithography
LDR:03005nam 2200385 a 4500 001 731099
003 SPIE
005 20101122134842.0
006 m e d
007 cr bn |||m|||a
008 130501s2010 waua fob 000 0 eng d
010 $z 2010026775
020 $a 9780819483256 (electronic)
020 $z 9780819483249 (print)
024 7 $a 10.1117/3.865363 $2 doi
035 $a (OCoLC)683257773
035 $a (CaBNVSL)gtp00544235
035 $a 9780819483256
040 $a CaBNVSL $c CaBNVSL $d CaBNVSL
050 4 $a TK7874 $b .L397 2010eb
082 0 4 $a 621.3815/31 $2 22
100 1 $a Levinson, Harry J. $3 877218
245 1 0 $a Principles of lithography $h [electronic resource] / $c Harry J. Levinson.
250 $a 3rd ed.
260 $a Bellingham, Wash. (1000 20th St. Bellingham WA 98225-6705 USA) : $b SPIE, $c 2010.
300 $a 1 online resource (xiii, 494 p.) : $b ill.
490 1 $a Press monograph ; $v 198
500 $a "SPIE digital library"--Website.
504 $a Includes bibliographical references.
505 0 $a Preface to the third edition -- Preface to the second edition -- Preface -- Chapter 1. Overview of lithography -- Chapter 2. Optical pattern formation -- Chapter 3. Photoresists -- Chapter 4. Modeling and thin-film effects -- Chapter 5. Wafer steppers -- Chapter 6. Overlay -- Chapter 7. Masks and reticles -- Chapter 8. Confronting the diffraction limit -- Chapter 9. Metrology -- Chapter 10. Immersion lithography and the limits of optical lithography -- Chapter 11. Lithography costs -- Chapter 12. Extreme ultraviolet lithography -- Chapter 13. Alternative lithography techniques -- Appendix A: Coherence.
506 $a Restricted to subscribers or individual electronic text purchasers.
520 $a The publication of Principles of Lithography, Third Edition just five years after the previous edition is evidence of the quickly changing and exciting nature of lithography as applied to the production of integrated circuits and other micro- and nanoscale devices. This text is intended to serve as an introduction to the science of microlithography, but also covers several subjects in depth, making it useful to the experienced lithographer as well. Topics directly related to manufacturing tools are addressed, including overlay, the stages of exposure, tools, and light sources. This updated edition reflects recent advances in technology, including the shift of immersion lithography from development into volume manufacturing, and the movement of EUV lithography from the lab to development pilot lines. New references and homework problems are included. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus.
530 $a Also available in print version.
538 $a Mode of access: World Wide Web.
538 $a System requirements: Adobe Acrobat Reader.
588 $a Title from PDF title page (SPIE eBooks Web site, viewed Oct. 22, 2010).
650 0 $a Integrated circuits $x Design and construction. $3 561265
650 0 $a Microlithography. $3 562355
655 0 $a Electronic books. $2 local $3 554714
710 2 $a Society of Photo-optical Instrumentation Engineers. $3 700253
830 0 $a SPIE Press monograph ; $v PM103. $3 877204
830 0 $a SPIE Digital Library. $3 877386
856 4 0 $3 SPIE $u http://dx.doi.org/10.1117/3.865363