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Characterization in compound semicon...
~
McGuire, G. E.
Characterization in compound semiconductor processing /
Record Type:
Language materials, printed : Monograph/item
Title/Author:
Characterization in compound semiconductor processing // editors, Yale Strausser and Gary E. McGuire.
remainder title:
Compound semiconductor processing.
other author:
McGuire, G. E.
Published:
New York :Momentum Press, : 2010.,
Description:
xvi, 199 p. :ill. ; : 25 cm.;
Notes:
"First published by Butterworth-Heinemann in 1995 ... Reissued volume published in 2010 by Momentum Press."--T.p. verso.
Subject:
Compound semiconductors - Surfaces. -
ISBN:
9781606500415 (cloth) :
Characterization in compound semiconductor processing /
Characterization in compound semiconductor processing /
Compound semiconductor processing.editors, Yale Strausser and Gary E. McGuire. - New York :Momentum Press,2010. - xvi, 199 p. :ill. ;25 cm. - Materials characterization series.
"First published by Butterworth-Heinemann in 1995 ... Reissued volume published in 2010 by Momentum Press."--T.p. verso.
Includes bibliographical references and index.
Characterization of III-V thin films for electronic devices -- III-V compound semiconductor films for optical applications -- Contacts -- Dielectric insulating layers -- Other compound semiconductor films -- Deep level sransient spectroscopy: a case study on GaAs -- Appendix: Technique summaries.
"Characterization in Compound Semiconductor Processing is for scientists and engineers working with compound semiconductor materials and devices who are not characterization specialists. Materials and processes typically used in R&D and in the fabrication of GaAs, GaA1As, InP and HgCdTe based devices provide examples of common analytical problems. The book discusses a variety of characterization techniques to provide insight into how each individually, or in combination, might be used in solving problems associated with these materials. The book will help in the selection and application of the appropriate analytical techniques by its coverage of all stages of materials or device processing: substrate preparation, epitaxial growth, dielectric film deposition, contact formation and dopant introduction."--P. [4] of cover.
ISBN: 9781606500415 (cloth) :NT2968Subjects--Topical Terms:
915240
Compound semiconductors
--Surfaces.
LC Class. No.: QC611.8.C64 / C48 2010
Dewey Class. No.: 621.3815/2
Characterization in compound semiconductor processing /
LDR
:02115cam a2200277 a 4500
001
756486
003
OCoLC
005
20110310082000.0
008
130912r20101995nyua b 001 0 eng d
020
$a
9781606500415 (cloth) :
$c
NT2968
020
$a
1606500414 (cloth)
020
$a
9781606500439 (ebook)
020
$a
1606500430 (ebook)
035
$a
(OCoLC)607476989
035
$a
607476989
040
$a
YDXCP
$c
YDXCP
$d
KKS
$d
CIN
$d
NFU
050
4
$a
QC611.8.C64
$b
C48 2010
082
0 4
$a
621.3815/2
$2
22
245
0 0
$a
Characterization in compound semiconductor processing /
$c
editors, Yale Strausser and Gary E. McGuire.
246
3 0
$a
Compound semiconductor processing.
260
$a
New York :
$c
2010.
$b
Momentum Press,
300
$a
xvi, 199 p. :
$b
ill. ;
$c
25 cm.
490
0
$a
Materials characterization series
500
$a
"First published by Butterworth-Heinemann in 1995 ... Reissued volume published in 2010 by Momentum Press."--T.p. verso.
504
$a
Includes bibliographical references and index.
505
0
$a
Characterization of III-V thin films for electronic devices -- III-V compound semiconductor films for optical applications -- Contacts -- Dielectric insulating layers -- Other compound semiconductor films -- Deep level sransient spectroscopy: a case study on GaAs -- Appendix: Technique summaries.
520
$a
"Characterization in Compound Semiconductor Processing is for scientists and engineers working with compound semiconductor materials and devices who are not characterization specialists. Materials and processes typically used in R&D and in the fabrication of GaAs, GaA1As, InP and HgCdTe based devices provide examples of common analytical problems. The book discusses a variety of characterization techniques to provide insight into how each individually, or in combination, might be used in solving problems associated with these materials. The book will help in the selection and application of the appropriate analytical techniques by its coverage of all stages of materials or device processing: substrate preparation, epitaxial growth, dielectric film deposition, contact formation and dopant introduction."--P. [4] of cover.
650
0
$a
Compound semiconductors
$x
Surfaces.
$3
915240
650
0
$a
Compound semiconductors.
$3
568176
700
1
$a
McGuire, G. E.
$3
904820
700
1
$a
Strausser, Yale.
$3
915239
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