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添加劑與酸鹼值以電化學原子層沉積銅薄膜於鈷基板之特性 = = Addit...

吳佳玲

添加劑與酸鹼值以電化學原子層沉積銅薄膜於鈷基板之特性 = = Additives and pH Value Affecting the Growth of Cu Film Prepared on a Cobalt-based Substrate via Electrochemical Atomic Layer Deposition /

Record Type:	Language materials, printed : Monograph/item
Title/Author:	添加劑與酸鹼值以電化學原子層沉積銅薄膜於鈷基板之特性 =/ 吳佳玲撰.
Reminder of title:	Additives and pH Value Affecting the Growth of Cu Film Prepared on a Cobalt-based Substrate via Electrochemical Atomic Layer Deposition /
remainder title:	Additives and pH Value Affecting the Growth of Cu Film Prepared on a Cobalt-based Substrate via Electrochemical Atomic Layer Deposition.
Author:	吳佳玲
Published:	雲林縣 :國立虎尾科技大學 , : 民106.07.,
Description:	[12], 162面 :圖, 表 ; : 30公分.;
Notes:	指導教授：方昭訓.
Subject:	citerate. -
Online resource:	http://cetd.lib.nfu.edu.tw/etdservice/view_metadata?etdun=U0028-1708201714390400

添加劑與酸鹼值以電化學原子層沉積銅薄膜於鈷基板之特性 = = Additives and pH Value Affecting the Growth of Cu Film Prepared on a Cobalt-based Substrate via Electrochemical Atomic Layer Deposition /
吳佳玲

添加劑與酸鹼值以電化學原子層沉積銅薄膜於鈷基板之特性 =Additives and pH Value Affecting the Growth of Cu Film Prepared on a Cobalt-based Substrate via Electrochemical Atomic Layer Deposition /Additives and pH Value Affecting the Growth of Cu Film Prepared on a Cobalt-based Substrate via Electrochemical Atomic Layer Deposition.吳佳玲撰. - 初版. - 雲林縣 :國立虎尾科技大學 ,民106.07. - [12], 162面 :圖, 表 ;30公分.

指導教授：方昭訓.

含參考書目.Subjects--Topical Terms:

1385921
citerate.

添加劑與酸鹼值以電化學原子層沉積銅薄膜於鈷基板之特性 = = Additives and pH Value Affecting the Growth of Cu Film Prepared on a Cobalt-based Substrate via Electrochemical Atomic Layer Deposition /
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246 3 1 $a Additives and pH Value Affecting the Growth of Cu Film Prepared on a Cobalt-based Substrate via Electrochemical Atomic Layer Deposition.
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500 $a 碩士論文--國立虎尾科技大學材料科學與工程系材料科學與綠色能源工程碩士班.
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650 # 4 $a citerate. $3 1385921
650 # 4 $a ethylenediamine. $3 1085094
650 # 4 $a cobalt substrate. $3 1385920
650 # 4 $a copper metallization. $3 1085096
650 # 4 $a Electrochemical atomic layer deposition. $3 1011341
650 # 4 $a 檸檬酸鈉. $3 1385919
650 # 4 $a 乙二胺. $3 1085097
650 # 4 $a 鈷基板. $3 1085098
650 # 4 $a 銅金屬化製程. $3 1085099
650 # 4 $a 電化學原子層沉積. $3 1011300
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