國立虎尾科技大學 |

Language: English

Back

臭氧水於晶圓洗淨過程濃度不穩之研究改善 = = Discuss and ...

張大成

臭氧水於晶圓洗淨過程濃度不穩之研究改善 = = Discuss and improvement the question of ozone concentration is unstable in the wafer cleaning process /

Record Type:	Language materials, printed : Monograph/item
Title/Author:	臭氧水於晶圓洗淨過程濃度不穩之研究改善 =/ 張大成.
Reminder of title:	Discuss and improvement the question of ozone concentration is unstable in the wafer cleaning process /
remainder title:	Discuss and improvement the question of ozone concentration is unstable in the wafer cleaning process.
Author:	張大成
Published:	雲林縣 :國立虎尾科技大學 , : 民108.09.,
Description:	[8], 53 面 :圖, 表 ; : 30公分.;
Notes:	指導教授: 陳興忪.
Subject:	Oxide film. -
Online resource:	電子資源

臭氧水於晶圓洗淨過程濃度不穩之研究改善 = = Discuss and improvement the question of ozone concentration is unstable in the wafer cleaning process /
張大成

臭氧水於晶圓洗淨過程濃度不穩之研究改善 =Discuss and improvement the question of ozone concentration is unstable in the wafer cleaning process /Discuss and improvement the question of ozone concentration is unstable in the wafer cleaning process.張大成. - 初版. - 雲林縣 :國立虎尾科技大學 ,民108.09. - [8], 53 面 :圖, 表 ;30公分.

指導教授: 陳興忪.

碩士論文--國立虎尾科技大學材料科學與工程系材料科學與綠色能源工程碩士在職專班.

含參考書目.

(平裝).Subjects--Topical Terms:

1083658
Oxide film.

臭氧水於晶圓洗淨過程濃度不穩之研究改善 = = Discuss and improvement the question of ozone concentration is unstable in the wafer cleaning process /
LDR:00990cam a2200217 i 4500 001 939456
008 200325s2019 ch ak erm 000 0 chi d
035 $a (THES)108NYPI1159001
040 $a NFU $b chi $c NFU $e CCR
041 0 # $a chi $b chi $b eng
084 $a 008.152M $b 1145 108 $2 ncsclt
100 1 $a 張大成 $3 1038466
245 1 0 $a 臭氧水於晶圓洗淨過程濃度不穩之研究改善 = $b Discuss and improvement the question of ozone concentration is unstable in the wafer cleaning process / $c 張大成.
246 1 1 $a Discuss and improvement the question of ozone concentration is unstable in the wafer cleaning process.
250 $a 初版.
260 # $a 雲林縣 : $b 國立虎尾科技大學 , $c 民108.09.
300 $a [8], 53 面 : $b 圖, 表 ; $c 30公分.
500 $a 指導教授: 陳興忪.
500 $a 學年度: 108.
502 $a 碩士論文--國立虎尾科技大學材料科學與工程系材料科學與綠色能源工程碩士在職專班.
504 $a 含參考書目.
563 $a (平裝).
650 # 4 $a Oxide film. $3 1083658
650 # 4 $a Metal contamination. $3 1225509
650 # 4 $a Particle. $3 1218177
650 # 4 $a Ozone water concentration. $3 1225508
650 # 4 $a Ozone water flow. $3 1225507
650 # 4 $a Ozone water. $3 1225506
650 # 4 $a Silicon wafer. $3 1225505
650 # 4 $a Wafer cleaning. $3 1225504
650 # 4 $a Single wafer cleaning machine. $3 1225503
650 # 4 $a Ozone generator. $3 1225502
650 # 4 $a 氧化膜. $3 1083660
650 # 4 $a 金屬汙染. $3 1225501
650 # 4 $a 微粒子. $3 1225500
650 # 4 $a 臭氧水濃度. $3 1225499
650 # 4 $a 臭氧水流量. $3 1225498
650 # 4 $a 臭氧水. $3 1225497
650 # 4 $a 矽晶圓. $3 1225496
650 # 4 $a 晶圓洗淨. $3 1225495
650 # 4 $a 枚葉式洗淨機. $3 1225494
650 # 4 $a 臭氧水產生器. $3 1225493
856 7 # $u http://handle.ncl.edu.tw/11296/24eqhe $z 電子資源 $2 http