鈷鎳合金薄膜.

調控鎳開路電位時間置換低電位沉積鈷製備鈷鎳合金薄膜特性 = = Co(Ni) Film Prepared by Controlling Open Circuit Potential Duration of Ni During Surface-limited Redox Replacement of the Underpotential Deposited Co / by: (Language materials, printed)

Co(Ni) alloy films.

EC-ALD.

Interconnects.

Surface-Limited Redox Reaction.

Underpotential Deposition.

低電位沉積.

表面侷限氧化還原置換.

連導線.

鈷鎳合金薄膜.

電化學原子層沉積.