銅.

徹底圖解最新「銅」の基礎&運用 : = 銅的歷史、性質、材料、加工的基礎知識 / by: (Language materials, printed)

以電化學原子層沉積銅釕薄膜之性質 = = Electrochemical Atomic Layer Deposition of Cu-Ru Film / by: (Language materials, printed)

以電化學原子層沉積法於TaN/Ta基板上製備銅薄膜之熱穩定性研究 = = Thermal Stability of Copper Film Prepared on a Tantalum Nitride/Tantalum Substrate by Electrochemical Atomic Layer Deposition / by: (Language materials, printed)

以鎳和銅包覆碳纖維增強錫 – 鉛合金之複合材料 = = Nickel- and copper-coated carbon fibre reinforced tin-lead alloy composites / by: (Language materials, printed)

具氧化鉬及氧化亞銅堆疊層與氧化鉬銅電洞選擇性接觸層之單晶矽太陽能電池光電特性研究 = = Photovoltaic Properties of Monocrystalline Silicon Solar Cells with Molybdenum Oxide and Cuprous Oxide Stacked Layers and Molybdenum Copper Oxide Hole-Selective Contact Layers / by: (Language materials, printed)

摻雜銅之氧化銦錫堆疊層對具氧化鉬電洞選擇性層及鋁背表面電場之單晶矽太陽能電池光電特性研究 = = Effects of Copper-Doped Indium Tin Oxide Stack Layers on Photovoltaic Properties of Monocrystalline Silicon Solar Cells with Molybdenum Oxides as Hole-Selective Layers and Al Back Surface Field / by: (Language materials, printed)

Copper.

Electrochemical atomic layer deposition (EC-ALD).

共蒸鍍.

電洞選擇性接觸層.

氧化亞銅.

Cu.

Stacked layers.

擴散阻障層.

Monocrystalline silicon solar cells.

氮化鉭.

Tantalum nitride.

錫 – 鉛合金.

釕.

Underpotential deposition.

Ru.

Molybdenum copper oxide.

電化學原子層沉積.

Nickel.

鎳.

Hole-selective contact layers.

Surface limited redox replacement (SLRR).

氧化銦錫.

單晶矽太陽能電池.

欠電位沉積.

Surface limited redox replacement.

Silicon solar cells.

堆疊層.

表面侷限氧化還原取代反應.

Electrochemical atomic layer deposition.

copper.

Tin-lead alloy.

Carbon fibre.

Indium tin oxide.

Cuprous oxide.

氧化鉬.

氧化鉬銅.

Molybdenum oxide.

Barrie.r

碳纖維.

Co-evaporation.

銅.

Underpotential deposition (UPD).