Chemical vapor deposition.
Overview
Works: | 17 works in 6 publications in 6 languages |
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Titles
Cmos-Compatible Strain Engineering and Device Scaling of Monolayer Molybdenum Disulfide Transistors.
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Strategic Advances in 2D Materials : = Low-Temperature Plasma-Enhanced Chemical Vapor Deposition Growth of Graphene and Complementary Insights into MoS₂.
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Optoelectronic and Thermal Properties of Metallic Transition Metal Dichalcogenides = = Gecis Metal Dikalkojenitlerinin Optoelektronik ve Termal Ozellikleri.
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Modification of a Commercial Activated Carbon with Nitrogen and Boron : = Hydrogen Storage Application.
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Growth and Characterization of Boron Nitride Thin Films and Nanostructures Using Atomic Layer Deposition = = Bor Nitrur Ince Filmlerin ve Nanoyapilarin Atomik Katman Biriktirme Yontemi Ile Buyutulmesi ve Karakterizasyonu.
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Diamond chemical vapor deposition = nucleation and early growth stages /
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Atomic layer deposition DUP_1 = principles, characteristics, and nanotechnology applications /
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Atomic layer deposition = principles, characteristics, and nanotechnology applications /
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Glancing angle deposition of thin films = engineering the nanoscale /
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Chemical vapor deposition growth and characterization of two-dimensional hexagonal boron nitride
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Chemical vapour deposition (CVD) : = advances, technology, and applications /
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Growth and transport in nanostructured materials = reactive transport in PVD, CVD, and ALD /
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