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鈦鋁摻雜氮氧化鉿鑭在前瞻金氧半電容特性研究 = Electrical a...

Yu-Zhen Wu

鈦鋁摻雜氮氧化鉿鑭在前瞻金氧半電容特性研究 = Electrical and Reliability Characteristics of Advanced Metal-Oxide-Semiconductor Capacitors with Various Ti- and Al-doped HfLaON Dielectrics

Record Type:	Language materials, printed : monographic
Paralel Title:	Electrical and Reliability Characteristics of Advanced Metal-Oxide-Semiconductor Capacitors with Various Ti- and Al-doped HfLaON Dielectrics
Author:	吳昱震,
Secondary Intellectual Responsibility:	洪政豪,
Secondary Intellectual Responsibility:	鄭錦隆,
Place of Publication:	雲林縣
Published:	國立虎尾科技大學;
Year of Publication:	民99[2010]
Edition:	初版
Description:	99面圖 : 30公分;
Subject:	後沉積熱處理
Subject:	氮氧化鈦鋁鉿鑭
Subject:	濺鍍機
Subject:	高介電係數
Subject:	HfLaTiAlON
Subject:	High-k
Subject:	Post-Deposition Annealing
Subject:	Sputter
Online resource:	http://cetd.lib.nfu.edu.tw/etdservice/view_metadata?etdun=U0028-2007201022402100

鈦鋁摻雜氮氧化鉿鑭在前瞻金氧半電容特性研究 = Electrical and Reliability Characteristics of Advanced Metal-Oxide-Semiconductor Capacitors with Various Ti- and Al-doped HfLaON Dielectrics
吳, 昱震

鈦鋁摻雜氮氧化鉿鑭在前瞻金氧半電容特性研究 = Electrical and Reliability Characteristics of Advanced Metal-Oxide-Semiconductor Capacitors with Various Ti- and Al-doped HfLaON Dielectrics / 吳昱震撰 - 初版. - 雲林縣 : 國立虎尾科技大學, 民99[2010]. - 99面 ; 圖 ; 30公分.
含參考書目.
後沉積熱處理氮氧化鈦鋁鉿鑭濺鍍機高介電係數HfLaTiAlONHigh-kPost-Deposition AnnealingSputter

洪, 政豪

鈦鋁摻雜氮氧化鉿鑭在前瞻金氧半電容特性研究 = Electrical and Reliability Characteristics of Advanced Metal-Oxide-Semiconductor Capacitors with Various Ti- and Al-doped HfLaON Dielectrics
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