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林隆奕

Overview

Works:	1 works in 1 publications in 1 languages

Titles

添加劑對鈷基薄膜上以電化學原子層沉積銅薄膜之研究 = = Additives Affecting the Growth of Cu Thin Film Prepared on Cobalt-Based Substrates by Electrochemical Atomic Layer Deposition / by: 林隆奕 (Language materials, printed)

Subjects

cobalt substrate.31083180 copper metallization. Electrochemical atomic layer deposition (EC-ALD). ethylenediamine. 乙二胺. 鈷基板. 銅金屬化製程. 電化學原子層沉積.

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