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方昭訓
Overview
| Works: | 0 works in 20 publications in 1 languages | |
|---|---|---|
Titles
OCC熱模連續鑄造法研究與應用 = Research and Application of the OCC Heated Mold Continuous Casting Method
by:
Jau-Shiung Fang; 陳浚科; Chun-Ke Chen; 方昭訓
(Language materials, printed)
共濺鍍沉積製備鈷-鈦-氧顆粒合金薄膜磁阻特性 = Evaluation of magnetoresistance characteristic of co-sputtered Co-Ti-O granular alloy thin films
by:
鄭文凱; Jau-Shiung Fang; 方昭訓
(Language materials, printed)
, [指導]
以金屬靶反應性磁控共濺鍍製備氧化銦鋅透明導電薄膜之研究 = Preparation and Properties of the Indium Zinc Oxide by Reactive Magnetron Co-sputtering using Indium and Zinc Metallic Targets
by:
Hui-Chin Chen; 方昭訓; 陳慧津; 國立虎尾科技大學; Jau-Shiung Fang
(Language materials, printed)
藍寶石基板之乾式蝕刻及其應用於氮化鎵發光二極體之研究 = Dry etching of sapphire substrates and its application for GaN-based light-emitting diodes
by:
武東星; Dong-Sing Wuu; 方昭訓; 施文忠; Jau-Shing Fang
(Language materials, printed)
, [指導]
RFID應用於局限空間e化管理之研究 = Applications of rfid in confined space management system
by:
Eric-Wang; Jau-Shiung Fang; Hung-Wei Chen; 王鵬堯; 方昭訓; 陳泓瑋
(Language materials, printed)
自我鈍化型銅鋁合金薄膜之抗氧化性及電性研究 = Improvement of Against Oxidation and Electrical Properties of Passivated Cu(Al) Thin Film
by:
方昭訓; 田宏吉; Jau-Shiung Fang; Hung-Chi Tien
(Language materials, printed)
銀鑭合金薄膜之抗氧化與抗硫化探討 = Study on against oxidation and sulfidation of ag(la) thin film
by:
方昭訓; Yaun-Ting Chan; 詹媛婷; Jau-Shiung Fang
(Language materials, printed)
雙層超薄Ru/Ta-Si-C擴散阻障層與銅連導線製程特性探討 = Properties of Ultrathin Ru/TaSiC Bi-Layer Diffusion Barrier for Cu Interconnects
by:
方昭訓; 黃孟碩; Meng-Shuo Huang; Jau-Shiung Fang
(Language materials, printed)
Cu(CoN)與CoN薄膜應用於銅製程之特性研究 = Characteristics of Cu(CoN) Film and CoN Film on Copper Interconnection
by:
Jau-Shiung Fang; 方昭訓; 王梓育; Tzu-Yu Wang
(Language materials, printed)
低電阻率自我鈍化型銅銦合金薄膜之固溶特性及電性研究 = Structural and passivate behaviors of Cu(In) thin film
by:
謝馨儀; 方昭訓; Jau-Shiung Fang
(Language materials, printed)
, [指導]
超薄Ta-Si-C 非晶質擴散阻障層銅製程特性探討 = Ultrathin ta-si-c amorphous films as a diffusion barrier for copper metallization
by:
邱敬富; Chin-Fu Chiu; Jau-Shiung Fang; 方昭訓
(Language materials, printed)
反應性濺鍍製備Ta-Co-N三元合金薄膜與銅金屬化製程整合特性探討 = Evaluation of Ternary Alloy TaCoN Thin Films Deposited by Reactive Sputtering for Copper Metallization
by:
Jau-Shiung Fang; 柯銘禮; 方昭訓
(Language materials, printed)
, [指導]
非晶質Ta-Ni薄膜製備與積體電路銅金屬化製程整合特性探討 = Evaluation of Ta-Ni amorphous thin film properties for copper metallization in integrated circuits
by:
方昭訓; 許藻錶; Jau-Shiung Fang
(Language materials, printed)
, [指導]
共濺鍍製備Cu1-xHfx薄膜擴散阻礙特性之研究 = Barrier properties of co-sputtering cu1-xhfx thin films
by:
Jau-Shiung Fang; Chih-Hsiang Huang; 黃智祥; 方昭訓
(Language materials, printed)
鐵鈷硼鈦鈮高熵合金薄膜應用於銅金屬化製程之探討 = Fe-Co-B-Ti-Nb High Entropy Thin Film for Copper Metallization
by:
Yi-Chiun Li; 楊立中; 李逸群; 方昭訓; Jau-Shiung Fang; Li-Chung Yang
(Language materials, printed)
化學鍍浴沉積法製備ZnO與ZnMnO透明導電氧化物薄膜之研究 = Preparation and properties of the zinc oxide and manganese-doped zinc oxide by chemical bath deposition
by:
駱煒翔; Wei-Hsiang Luo; 方昭訓; Jau-Shiung Fang.
(Language materials, printed)
5 nm之Ru-(Ta)-B擴散阻障層與銅製程特性 = 5 nm of Ru-(Ta)-B diffusion barrier layer and copper processing characteristics
by:
Jau-Shiun Fang; 方昭訓; 李文菁; Wen-Jing Li
(Language materials, printed)
鈷基合金薄膜之磁阻特性研究 = Study of magnetoresistance characteristic of cobalt-based thin films
by:
Ssu-Yu Lai; 方昭訓; 賴思宇; Jau-Shiung Fang; 國立虎尾科技大學
(Language materials, printed)
Ta-Si-C 非晶質擴散阻障應用於 銅製程之特性研究 = Characteristics of amorphous Ta-Si-C film as a diffusion barrier for copper metallization
by:
方昭訓; Jau-Shiung Fang; 蘇武加; Wu-Jia Su
(Language materials, printed)
自我鈍化型銅鉿合金薄膜之抗氧化性及電性研究 = Improvement of against oxidation and electrical properties of passivated cu(hf) thin film
by:
方昭訓; 陳佑慈; Yu-Tzu Chen; Jau-Shiung Fang
(Language materials, printed)
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Subjects
擴散阻障層
低電阻率
reactive magnetron co-sputter
Cu(HEA)合金薄膜
thermal stability
magnetron sputtering
熱模連續鑄造
sulfidation
Ta-Si-C
薄膜電晶體
氧化銦
共濺鍍法
Cu electroplating
阻障層
反應性磁控濺鍍
Cu seed layer
化學鍍浴沉積法
chemical bath deposition
Copper metallization
Cu(Hf) alloy films
zinc oxide
self-passivated
附著性
銅晶種層
Cu(Al) alloy thin film
adhesion
Cu(HEA) alloy thin film
鉭
high entropy alloy
copper metallization
amorphous
plasma surface treatment
Cu(In) alloy thin film
Ta-Co-N films
磁控濺鍍
Ta-Si-C(O)x
copper
透明導電薄膜
硫化
銅製程
tunneling magnetoresistance
合金薄膜
Thin-film transistor
indium zinc oxide
磁控共濺鍍
釕
self-passivation
substrate bias
Ta-Si-C 薄膜
氧化鋅
magnetoresistance
cobalt nitrides
HfN
Ohno Continuous Casting
碳
TaSi2
勞工
顆粒合金薄膜
銅
Ta-B
sputtering deposition
Ru-Ta-B
TaNi amorphous hin film
Ag(La) alloy thin film
自我鈍化
銅鉿合金薄膜
電鍍銅
manganese
無線射頻辨識技術
Ru-B
承攬商
low resistivity
銀鑭合金薄膜
transparent conducting oxide
共濺鍍
稀磁半導體
co-sputtering
Magnetron Sputter
氮化鈷
錳
非晶質薄膜
鉭矽化物
穿隧磁阻
heated mold
基板偏壓
銅銦合金薄膜
非晶質
Cu(CoN) alloy thin film
Carbon
labor
銅鋁合金薄膜
高熵合金
銅鈷氮合金薄膜
電漿表面改質
銅金屬化製程
局限空間
amorphous films
Cu(Hf) alloy thin film
加熱鑄模
diluted magnetic semiconductor
氮化鉿
RFID
contract worker
熱穩定性
非晶質TaNi薄膜
Cu metallization
confined space
濺鍍
擴散阻礙層
co-sputter
diffusion barrier