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以反應式射頻磁控共濺鍍系統沉積鈦摻雜氮化鋁硬化膜之研究 = = A st...

游逵守

以反應式射頻磁控共濺鍍系統沉積鈦摻雜氮化鋁硬化膜之研究 = = A study on the Ti-doping aluminum nitride hard coating prepared using the reactive radio frequency magnetron co-sputtering system /

Record Type:	Language materials, printed : Monograph/item
Title/Author:	以反應式射頻磁控共濺鍍系統沉積鈦摻雜氮化鋁硬化膜之研究 =/ 游逵守.
Reminder of title:	A study on the Ti-doping aluminum nitride hard coating prepared using the reactive radio frequency magnetron co-sputtering system /
remainder title:	A study on the Ti-doping aluminum nitride hard coating prepared using the reactive radio frequency magnetron co-sputtering system.
Author:	游逵守
Published:	雲林縣 :國立虎尾科技大學 , : 民112.01.,
Description:	[8], 76面 :圖, 表 ; : 30公分.;
Notes:	指導教授: 劉代山.
Subject:	Residual stress. -
Online resource:	電子資源

以反應式射頻磁控共濺鍍系統沉積鈦摻雜氮化鋁硬化膜之研究 = = A study on the Ti-doping aluminum nitride hard coating prepared using the reactive radio frequency magnetron co-sputtering system /
游逵守

以反應式射頻磁控共濺鍍系統沉積鈦摻雜氮化鋁硬化膜之研究 =A study on the Ti-doping aluminum nitride hard coating prepared using the reactive radio frequency magnetron co-sputtering system /A study on the Ti-doping aluminum nitride hard coating prepared using the reactive radio frequency magnetron co-sputtering system.游逵守. - 初版. - 雲林縣 :國立虎尾科技大學 ,民112.01. - [8], 76面 :圖, 表 ;30公分.

指導教授: 劉代山.

碩士論文--國立虎尾科技大學光電工程系光電與材料科技碩士班.

含參考書目.

(平裝).Subjects--Topical Terms:

1083680
Residual stress.

以反應式射頻磁控共濺鍍系統沉積鈦摻雜氮化鋁硬化膜之研究 = = A study on the Ti-doping aluminum nitride hard coating prepared using the reactive radio frequency magnetron co-sputtering system /
LDR:01040cam a2200217 i 4500 001 1097383
008 230314s2023 ch ak erm 000 0 chi d
035 $a (THES)111NYPI0124005
040 $a NFU $b chi $c NFU $e CCR
041 0 # $a chi $b chi $b eng
084 $a 008.166M $b 3833 112 $2 ncsclt
100 1 $a 游逵守 $3 1407039
245 1 0 $a 以反應式射頻磁控共濺鍍系統沉積鈦摻雜氮化鋁硬化膜之研究 = $b A study on the Ti-doping aluminum nitride hard coating prepared using the reactive radio frequency magnetron co-sputtering system / $c 游逵守.
246 1 1 $a A study on the Ti-doping aluminum nitride hard coating prepared using the reactive radio frequency magnetron co-sputtering system.
250 $a 初版.
260 # $a 雲林縣 : $b 國立虎尾科技大學 , $c 民112.01.
300 $a [8], 76面 : $b 圖, 表 ; $c 30公分.
500 $a 指導教授: 劉代山.
500 $a 學年度: 111.
502 $a 碩士論文--國立虎尾科技大學光電工程系光電與材料科技碩士班.
504 $a 含參考書目.
563 $a (平裝).
650 # 4 $a Residual stress. $3 1083680
650 # 4 $a Flex. $3 1407205
650 # 4 $a Adhesion. $3 712668
650 # 4 $a TMS buffer layer. $3 1407204
650 # 4 $a Flexible Plastic Substrate. $3 1407203
650 # 4 $a Hardness. $3 1011576
650 # 4 $a Ti-doped aluminum nitride optical hard coating. $3 1407202
650 # 4 $a Reactive RF magnetron co-sputtering system. $3 1407201
650 # 4 $a 殘留內應力. $3 1407200
650 # 4 $a 機械撓曲. $3 1407199
650 # 4 $a 附著度. $3 1086383
650 # 4 $a 有機矽基緩衝層. $3 1407198
650 # 4 $a 可撓式塑膠基板. $3 1407197
650 # 4 $a 機械硬度. $3 1407196
650 # 4 $a 鈦摻雜氮化鋁光學硬化膜. $3 1407195
650 # 4 $a 反應式射頻磁控共濺鍍系統. $3 1407194
856 7 # $u https://handle.ncl.edu.tw/11296/e5rea6 $z 電子資源 $2 http