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調控Ru開路電位時間置換低電位沉積Co單層製備CoRu合金薄膜特性 = ...

黃重誠

調控Ru開路電位時間置換低電位沉積Co單層製備CoRu合金薄膜特性 = = Co(Ru) Alloy Thin Film Prepared by Controlling Ru-OCP Time during SLRR to replace the Co-UPD /

Record Type:	Language materials, printed : Monograph/item
Title/Author:	調控Ru開路電位時間置換低電位沉積Co單層製備CoRu合金薄膜特性 =/ 黃重誠.
Reminder of title:	Co(Ru) Alloy Thin Film Prepared by Controlling Ru-OCP Time during SLRR to replace the Co-UPD /
remainder title:	Co(Ru) Alloy Thin Film Prepared by Controlling Ru-OCP Time during SLRR to replace the Co-UPD.
Author:	黃重誠
Published:	雲林縣 :國立虎尾科技大學 , : 民109.07.,
Description:	[12], 105面 :圖, 表 ; : 30公分.;
Notes:	指導教授: 方昭訓.
Subject:	interconnects. -
Online resource:	電子資源

調控Ru開路電位時間置換低電位沉積Co單層製備CoRu合金薄膜特性 = = Co(Ru) Alloy Thin Film Prepared by Controlling Ru-OCP Time during SLRR to replace the Co-UPD /
黃重誠

調控Ru開路電位時間置換低電位沉積Co單層製備CoRu合金薄膜特性 =Co(Ru) Alloy Thin Film Prepared by Controlling Ru-OCP Time during SLRR to replace the Co-UPD /Co(Ru) Alloy Thin Film Prepared by Controlling Ru-OCP Time during SLRR to replace the Co-UPD.黃重誠. - 初版. - 雲林縣 :國立虎尾科技大學 ,民109.07. - [12], 105面 :圖, 表 ;30公分.

指導教授: 方昭訓.

碩士論文--國立虎尾科技大學材料科學與工程系材料科學與綠色能源工程碩士班.

含參考書目.

(平裝).Subjects--Topical Terms:

1245710
interconnects.

調控Ru開路電位時間置換低電位沉積Co單層製備CoRu合金薄膜特性 = = Co(Ru) Alloy Thin Film Prepared by Controlling Ru-OCP Time during SLRR to replace the Co-UPD /
LDR:00993cam a2200217 i 4500 001 954714
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035 $a (THES)108NYPI0159004
040 $a NFU $b chi $c NFU $e CCR
041 0 # $a chi $b chi $b eng
084 $a 008.152M $b 4420:2 109 $2 ncsclt
100 1 $a 黃重誠 $3 1244627
245 1 0 $a 調控Ru開路電位時間置換低電位沉積Co單層製備CoRu合金薄膜特性 = $b Co(Ru) Alloy Thin Film Prepared by Controlling Ru-OCP Time during SLRR to replace the Co-UPD / $c 黃重誠.
246 1 1 $a Co(Ru) Alloy Thin Film Prepared by Controlling Ru-OCP Time during SLRR to replace the Co-UPD.
250 $a 初版.
260 # $a 雲林縣 : $b 國立虎尾科技大學 , $c 民109.07.
300 $a [12], 105面 : $b 圖, 表 ; $c 30公分.
500 $a 指導教授: 方昭訓.
500 $a 學年度: 108.
502 $a 碩士論文--國立虎尾科技大學材料科學與工程系材料科學與綠色能源工程碩士班.
504 $a 含參考書目.
563 $a (平裝).
650 # 4 $a interconnects. $3 1245710
650 # 4 $a Self-Forming Barrier Layer. $3 1215705
650 # 4 $a Surface-Limited Redox Reaction. $3 1215704
650 # 4 $a underpotential Deposition. $3 1245709
650 # 4 $a Co(Ru) alloy films. $3 1245708
650 # 4 $a 連導線. $3 1011310
650 # 4 $a 表面侷限氧化還原置換. $3 1245707
650 # 4 $a 低電位沉積. $3 1011312
650 # 4 $a 電化學原子層沉積. $3 1011300
650 # 4 $a 鈷釕合金薄膜. $3 1245706
856 7 # $u https://handle.ncl.edu.tw/11296/43bx92 $z 電子資源 $2 http