有機矽基薄膜.

氧電漿蝕刻技術對於自組裝奈米球之影響及其應用於提升有機矽基疏水膜特性之研究 = = A study on the self-assembled nanospheres affects by the oxygen plasma etching and its application for improving the hydrophobicity of a organosilicon thin film / by: (書目-語言資料,印刷品)

具厚膜修飾圖案化水氣阻障層撓曲及照光可靠性之研究 = = Study on the flexure and illumination reliability of the thick film modified patterned water vapor barrier / by: (書目-語言資料,印刷品)

氣體阻障層製備於具有連續沉積-蝕刻有機矽基覆蓋之圖案化表面之研究 = = A Study on the Preparation of a Gas Barrier Coated on Patterned Surface Coveraged by Organosilicon Film Using Consecutive Deposition-Etching Process / by: (書目-語言資料,印刷品)

氣體阻障層製備於具底角優化之底切圖案化表面之研究 = = A Study on the Preparation of a Gas Barrier Coated on Optimization Undercut Pattern Surface / by: (書目-語言資料,印刷品)

氣體阻障層結構具底切圖案化光阻表面覆蓋性及機械撓曲特性之研究 = = A Study on the Step Coverage and Mechanical Flexibility of the Gas Barrier Structure deposited onto the Photoresist Surface with Undercut Pattern / by: (書目-語言資料,印刷品)

電漿增強化學氣相沉積法.

hydrophobic properties.

太陽光.

silicon oxide.

step coverage.

polystyrene nanospheres.

電漿增強化學氣相沉積.

電漿蝕刻.

紫外光.

Taguchi method.

二氧化矽.

water vapor permeability.

選擇性沉積.

rapid plasma deposition.

撓曲測試.

VHF-PECVD.

有機矽基薄膜.

under-cut patterned.

silicone based film.

plasma enhanced chemical vapor deposition.

底切圖案化.

田口法.

over-cut patterned.

organosilicon.

UV.

Oxygen plasma etching technology.

Sunlight.

疏水特性.

selective deposition.

bending reliability.

頂切圖案化.

plasma etching.

氮氧化矽薄膜.

高頻電漿增強化學氣相沉積法.

射頻電漿增強化學氣相沉積法.

氧電漿蝕刻技術.

快速電漿沉積.

聚苯乙烯奈米球.

無機氮氧化矽.

階梯覆蓋性.

inorganic silicon oxynitride.

水氣滲透率.